Temperature influence on mechanical properties of chromium nitride thin films

Thin films present interest for researchers due to their applicability in areas such as developing microelecromechanical devices, hard coatings, cutting tools and diffusion barriers. This paper is focused on studying the influence of the testing temperature on the mechanical properties of chromium n...

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Published inIOP conference series. Materials Science and Engineering Vol. 724; no. 1; pp. 12062 - 12067
Main Authors şerdean, F M, Merie, V V, Negrea, G, Bîrleanu, C, Mărieş, I
Format Journal Article
LanguageEnglish
Published Bristol IOP Publishing 01.01.2020
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Abstract Thin films present interest for researchers due to their applicability in areas such as developing microelecromechanical devices, hard coatings, cutting tools and diffusion barriers. This paper is focused on studying the influence of the testing temperature on the mechanical properties of chromium nitride (CrN) thin films. For this purpose, CrN thin films were deposited by direct current magnetron sputtering on silicon substrate using a chromium target of high purity. All the films were obtained by keeping almost all deposition parameters constant, while the nitrogen flow rate was varied. Hence, three types of samples of CrN thin films were obtained using different nitrogen flow rates namely 2 cm3/min, 4 cm3/min and 6 cm3/min. The mechanical properties of these thin films such as the hardness and Young's modulus were investigated by performing nanoindentation using an atomic force microscope. All experimental investigations were conducted by varying the testing temperature between 20 oC and 100 oC. The purpose was to find the dependency between the testing temperature and the mechanical properties of CrN films deposited at different nitrogen flow rates. The obtained experimental results indicate a significant influence of the testing temperature on the properties of the studied CrN thin films.
AbstractList Thin films present interest for researchers due to their applicability in areas such as developing microelecromechanical devices, hard coatings, cutting tools and diffusion barriers. This paper is focused on studying the influence of the testing temperature on the mechanical properties of chromium nitride (CrN) thin films. For this purpose, CrN thin films were deposited by direct current magnetron sputtering on silicon substrate using a chromium target of high purity. All the films were obtained by keeping almost all deposition parameters constant, while the nitrogen flow rate was varied. Hence, three types of samples of CrN thin films were obtained using different nitrogen flow rates namely 2 cm3/min, 4 cm3/min and 6 cm3/min. The mechanical properties of these thin films such as the hardness and Young's modulus were investigated by performing nanoindentation using an atomic force microscope. All experimental investigations were conducted by varying the testing temperature between 20 oC and 100 oC. The purpose was to find the dependency between the testing temperature and the mechanical properties of CrN films deposited at different nitrogen flow rates. The obtained experimental results indicate a significant influence of the testing temperature on the properties of the studied CrN thin films.
Abstract Thin films present interest for researchers due to their applicability in areas such as developing microelecromechanical devices, hard coatings, cutting tools and diffusion barriers. This paper is focused on studying the influence of the testing temperature on the mechanical properties of chromium nitride (CrN) thin films. For this purpose, CrN thin films were deposited by direct current magnetron sputtering on silicon substrate using a chromium target of high purity. All the films were obtained by keeping almost all deposition parameters constant, while the nitrogen flow rate was varied. Hence, three types of samples of CrN thin films were obtained using different nitrogen flow rates namely 2 cm 3 /min, 4 cm 3 /min and 6 cm 3 /min. The mechanical properties of these thin films such as the hardness and Young’s modulus were investigated by performing nanoindentation using an atomic force microscope. All experimental investigations were conducted by varying the testing temperature between 20 oC and 100 oC. The purpose was to find the dependency between the testing temperature and the mechanical properties of CrN films deposited at different nitrogen flow rates. The obtained experimental results indicate a significant influence of the testing temperature on the properties of the studied CrN thin films.
Author Merie, V V
şerdean, F M
Negrea, G
Bîrleanu, C
Mărieş, I
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Snippet Thin films present interest for researchers due to their applicability in areas such as developing microelecromechanical devices, hard coatings, cutting tools...
Abstract Thin films present interest for researchers due to their applicability in areas such as developing microelecromechanical devices, hard coatings,...
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SubjectTerms Atomic force microscopes
Atomic force microscopy
Chromium nitride
Cutting equipment
Cutting tools
Diffusion barriers
Diffusion coatings
Direct current
Flow velocity
Magnetron sputtering
Mechanical properties
Modulus of elasticity
Nanoindentation
Nitrogen
Silicon substrates
Temperature dependence
Thin films
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Title Temperature influence on mechanical properties of chromium nitride thin films
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