Very high frequency plasma CVD of silicon oxide

Different principal types of plasma-enhanced chemical vapour deposition (PECVD) processes of silicon oxides are used: the conventional RF (13.56 MHz) PECVD, remote PECVD, inductive coupled high density plasma CVD and very high frequency (VHF) PECVD. Single-wafer chambers with parallel-plate PECVD sy...

Full description

Saved in:
Bibliographic Details
Published inSurface & coatings technology Vol. 200; no. 1-4; pp. 364 - 367
Main Authors Schade, K., Stahr, F., Röhlecke, S., Steinke, O., Richter, R.H., Schopper, F., Heinzinger, K., Hartung, J.
Format Journal Article Conference Proceeding
LanguageEnglish
Published Lausanne Elsevier B.V 01.10.2005
Elsevier
Subjects
Online AccessGet full text

Cover

Loading…