Dynamical cooling of semiconductor by contact layer
The subject of this paper is the presentation of a simple theoretical model of cooling of a semiconductor. The problem of the unsteady behaviour both of the semiconductor and of the cold plate that are in touch by the contact layer was studied analytically. The influence of the parameters of the mat...
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Published in | International journal of heat and mass transfer Vol. 48; no. 14; pp. 2922 - 2925 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
Oxford
Elsevier Ltd
01.07.2005
Elsevier |
Subjects | |
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Abstract | The subject of this paper is the presentation of a simple theoretical model of cooling of a semiconductor. The problem of the unsteady behaviour both of the semiconductor and of the cold plate that are in touch by the contact layer was studied analytically. The influence of the parameters of the materials and the cooling conditions was investigated. The results in the form of an analytical formula and graphs are presented and the heat stream is compared with the experimental results. |
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AbstractList | The subject of this paper is the presentation of a simple theoretical model of cooling of a semiconductor. The problem of the unsteady behaviour both of the semiconductor and of the cold plate that are in touch by the contact layer was studied analytically. The influence of the parameters of the materials and the cooling conditions was investigated. The results in the form of an analytical formula and graphs are presented and the heat stream is compared with the experimental results. |
Author | Król, Fabian Lipnicki, Zygmunt |
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Keywords | Thermal properties Temperature distribution Cooling Semiconductor materials Transition elements Thermal contacts Analytical method Dynamic properties Solid-solid interfaces Copper Heat transfer |
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References | Furmański, Wiśniewski (bib5) 2002 Z. Ignaszak, Z. Lipnicki, A. Bydalek, Solidification of liquid metal flowing below a cold Plate, Fifth International Pamir Conference on Fundamental and Applied MHD, vol. 2, II131–II136, Ramatuelle, France, 2002 Loulou, Artyukhin, Bardon (bib6) 1999; 42 Wang, Muller (bib1) 2000; 31 Darabi, Ekula (bib2) 2003; 34 Lipnicki (bib4) 2003 Loulou, Artyukhin, Bardon (bib7) 1999; 42 Lipnicki (10.1016/j.ijheatmasstransfer.2005.02.011_bib4) 2003 Darabi (10.1016/j.ijheatmasstransfer.2005.02.011_bib2) 2003; 34 Furmański (10.1016/j.ijheatmasstransfer.2005.02.011_bib5) 2002 Loulou (10.1016/j.ijheatmasstransfer.2005.02.011_bib7) 1999; 42 Wang (10.1016/j.ijheatmasstransfer.2005.02.011_bib1) 2000; 31 10.1016/j.ijheatmasstransfer.2005.02.011_bib3 Loulou (10.1016/j.ijheatmasstransfer.2005.02.011_bib6) 1999; 42 |
References_xml | – volume: 31 start-page: 765 year: 2000 end-page: 771 ident: bib1 article-title: Improving cooling efficiency by increasing fan power usage publication-title: Microelectron. J. – reference: Z. Ignaszak, Z. Lipnicki, A. Bydalek, Solidification of liquid metal flowing below a cold Plate, Fifth International Pamir Conference on Fundamental and Applied MHD, vol. 2, II131–II136, Ramatuelle, France, 2002 – volume: 34 start-page: 1067 year: 2003 end-page: 1074 ident: bib2 article-title: Development of a chip-integrated micro cooling device publication-title: Microelectron. J. – volume: 42 start-page: 2119 year: 1999 end-page: 2127 ident: bib6 article-title: Estimation of thermal contact resistance during the first stages of metal solidification process: I—experiment principle and modelisation publication-title: Int. J. Heat Mass Transfer – volume: 42 start-page: 2129 year: 1999 end-page: 2142 ident: bib7 article-title: Estimation of thermal contact resistance during the first stages of metal solidification process: II—experimental setup and results publication-title: Int. J. Heat Mass Transfer – start-page: 2149 year: 2003 end-page: 2154 ident: bib4 article-title: Role of the contact layer between liquid and solid on solidification process publication-title: Int. J. Heat Mass Transfer – year: 2002 ident: bib5 article-title: Thermal contact resistance and thermal phenomena at solid–solid interface – volume: 34 start-page: 1067 year: 2003 ident: 10.1016/j.ijheatmasstransfer.2005.02.011_bib2 article-title: Development of a chip-integrated micro cooling device publication-title: Microelectron. J. doi: 10.1016/j.mejo.2003.09.010 – volume: 42 start-page: 2129 year: 1999 ident: 10.1016/j.ijheatmasstransfer.2005.02.011_bib7 article-title: Estimation of thermal contact resistance during the first stages of metal solidification process: II—experimental setup and results publication-title: Int. J. Heat Mass Transfer doi: 10.1016/S0017-9310(98)00338-X – ident: 10.1016/j.ijheatmasstransfer.2005.02.011_bib3 – volume: 42 start-page: 2119 year: 1999 ident: 10.1016/j.ijheatmasstransfer.2005.02.011_bib6 article-title: Estimation of thermal contact resistance during the first stages of metal solidification process: I—experiment principle and modelisation publication-title: Int. J. Heat Mass Transfer doi: 10.1016/S0017-9310(98)00333-0 – volume: 31 start-page: 765 year: 2000 ident: 10.1016/j.ijheatmasstransfer.2005.02.011_bib1 article-title: Improving cooling efficiency by increasing fan power usage publication-title: Microelectron. J. doi: 10.1016/S0026-2692(00)00057-4 – start-page: 2149 year: 2003 ident: 10.1016/j.ijheatmasstransfer.2005.02.011_bib4 article-title: Role of the contact layer between liquid and solid on solidification process publication-title: Int. J. Heat Mass Transfer doi: 10.1016/S0017-9310(02)00531-8 – year: 2002 ident: 10.1016/j.ijheatmasstransfer.2005.02.011_bib5 |
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Title | Dynamical cooling of semiconductor by contact layer |
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