Third-order optical nonlinearity in nonstoichiometric amorphous silicon carbide films

• Published in: Journal of alloys and compounds Vol. 794; pp. 518 - 524
• Main Authors: Yu, Xiuru, Ding, Baoyong, Lu, Heng, Huo, Yanyan, Peng, Qianqian, Xiu, Xianwu, Zhang, Chao, Yang, Cheng, Jiang, Shouzhen, Man, Baoyuan, Ning, Tingyin
• Format: Journal Article
• Language: English
• Published: Lausanne Elsevier B.V 25.07.2019; Elsevier BV
• Subjects: Amorphous materials; Amorphous silicon; Annealing; Apertures; Defocusing; Magnetic properties; Magnetron sputtering; Nonlinearity; Optical properties; Photon absorption; Photovoltaic cells; Pulse duration; Refractivity; SiC film; Silicon carbide; Third-order optical nonlinearity; Z-scan; SiC film; Z-scan; Third-order optical nonlinearity

This study investigated the third-order nonlinear optical properties of amorphous silicon carbide (SiC) films prepared via magnetron sputtering at room temperature (RT) and annealed at 200 °C–800 °C. The third-order optical nonlinearity was investigated by Z-scan measurement at a wavelength of 1064 ...