Photodamage attenuating potential of Nectandra hihua against UVB-induced oxidative stress in L929 fibroblasts

• Published in: Journal of photochemistry and photobiology. B, Biology Vol. 181; pp. 127 - 133
• Main Authors: Oliveira, Mariana Maciel de, Daré, Regina Gomes, Barizão, Érica Oliveira, Visentainer, Jesuí Vergílio, Romagnolo, Mariza Barion, Nakamura, Celso Vataru, Truiti, Maria da Conceição Torrado
• Format: Journal Article
• Language: English
• Published: Switzerland Elsevier B.V 01.04.2018; Elsevier BV
• Subjects: Acetic acid; Antioxidants; Butylated hydroxytoluene; Damage prevention; Ethyl acetate; Fibroblasts; Flavonoids; Inhibition; L929 fibroblasts; Leaves; Lipid peroxidation; Nectandra hihua; Oxidative stress; Peroxidation; Phenolic compounds; Phenols; Photochemoprotective effect; Pretreatment; Quercetin; Reactive oxygen species; Skin; Ultraviolet radiation; UVB radiation; Oxidative stress; L929 fibroblasts; UVB radiation; Photochemoprotective effect

The total phenolic content (TP) and antioxidant activity of the ethanolic extract and fractions that were obtained from the leaves of Nectandra hihua were assessed using different methods. The ethanolic extract (EE) and ethyl acetate fraction (EAF) had the best antioxidant capacity, which was compar...