APA (7th ed.) Citation

Wang, Q., Huang, F., Cui, Y., Yoshida, H., Wen, L., & Jin, Y. (2021). Influences of formation potential on oxide film of TC4 in 0.5 M sulfuric acid. Applied Surface Science, 544, 148888. https://doi.org/10.1016/j.apsusc.2020.148888

Chicago Style (17th ed.) Citation

Wang, Qingrui, Feifei Huang, Yi-Tao Cui, Hiroaki Yoshida, Lei Wen, and Ying Jin. "Influences of Formation Potential on Oxide Film of TC4 in 0.5 M Sulfuric Acid." Applied Surface Science 544 (2021): 148888. https://doi.org/10.1016/j.apsusc.2020.148888.

MLA (9th ed.) Citation

Wang, Qingrui, et al. "Influences of Formation Potential on Oxide Film of TC4 in 0.5 M Sulfuric Acid." Applied Surface Science, vol. 544, 2021, p. 148888, https://doi.org/10.1016/j.apsusc.2020.148888.