Optical and transport properties of InSb thin films grown on GaAs by metalorganic chemical vapor deposition
Optical and transport properties of InSb thin films grown on GaAs by metalorganic chemical vapor deposition (MOCVD) have been investigated by far-infrared (FIR) reflectance spectroscopy. The lattice vibration behaviors of a series of MOCVD InSb/GaAs(100) materials grown under different growth condit...
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Published in | Thin solid films Vol. 498; no. 1; pp. 158 - 162 |
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Abstract | Optical and transport properties of InSb thin films grown on GaAs by metalorganic chemical vapor deposition (MOCVD) have been investigated by far-infrared (FIR) reflectance spectroscopy. The lattice vibration behaviors of a series of MOCVD InSb/GaAs(100) materials grown under different growth conditions were studied. Effects of III–V source ratios on the films crystalline quality were examined. Two additional weak modes in the wavenumber regions of 210–240 cm
−
1 were observed and they appeared more prominent at low temperatures. Interference fringe effects modify the FIR reflectance band of the GaAs substrate, which are related to the uniformity of film thickness and crystalline perfection. The dielectric constant, phonon modes and other optical parameters, as well as transport properties including carrier concentration, mobility, effective mass were calculated theoretically and compared with experimental results. The obtained distribution values of the InSb LO phonon mode frequency, line width, relative integrated intensity ratio between the forbidden and defect-related TO phonon and the allowed LO mode are adopted as figures of merit for the quality of the InSb films. The electrical transport properties of carrier concentration, mobility, and effective mass as well as the dielectric constant of these films have been determined by optical method non-destructively. |
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AbstractList | Optical and transport properties of InSb thin films grown on GaAs by metalorganic chemical vapor deposition (MOCVD) have been investigated by far-infrared (FIR) reflectance spectroscopy. The lattice vibration behaviors of a series of MOCVD InSb/GaAs(100) materials grown under different growth conditions were studied. Effects of III-V source ratios on the films crystalline quality were examined. Two additional weak modes in the wavenumber regions of 210-240 cm-1were observed and they appeared more prominent at low temperatures. Interference fringe effects modify the FIR reflectance band of the GaAs substrate, which are related to the uniformity of film thickness and crystalline perfection. The dielectric constant, phonon modes and other optical parameters, as well as transport properties including carrier concentration, mobility, effective mass were calculated theoretically and compared with experimental results. The obtained distribution values of the InSb LO phonon mode frequency, line width, relative integrated intensity ratio between the forbidden and defect-related TO phonon and the allowed LO mode are adopted as figures of merit for the quality of the InSb films. The electrical transport properties of carrier concentration, mobility, and effective mass as well as the dielectric constant of these films have been determined by optical method non-destructively. Optical and transport properties of InSb thin films grown on GaAs by metalorganic chemical vapor deposition (MOCVD) have been investigated by far-infrared (FIR) reflectance spectroscopy. The lattice vibration behaviors of a series of MOCVD InSb/GaAs(100) materials grown under different growth conditions were studied. Effects of III–V source ratios on the films crystalline quality were examined. Two additional weak modes in the wavenumber regions of 210–240 cm − 1 were observed and they appeared more prominent at low temperatures. Interference fringe effects modify the FIR reflectance band of the GaAs substrate, which are related to the uniformity of film thickness and crystalline perfection. The dielectric constant, phonon modes and other optical parameters, as well as transport properties including carrier concentration, mobility, effective mass were calculated theoretically and compared with experimental results. The obtained distribution values of the InSb LO phonon mode frequency, line width, relative integrated intensity ratio between the forbidden and defect-related TO phonon and the allowed LO mode are adopted as figures of merit for the quality of the InSb films. The electrical transport properties of carrier concentration, mobility, and effective mass as well as the dielectric constant of these films have been determined by optical method non-destructively. |
Author | Cheng, Yukun Chuan Feng, Zhe Wang, Jyun-Bi Yang, Tzuen-Rong |
Author_xml | – sequence: 1 givenname: Tzuen-Rong surname: Yang fullname: Yang, Tzuen-Rong organization: Department of Physics, National Taiwan Normal University, Taipei, 116 Taiwan, ROC – sequence: 2 givenname: Yukun surname: Cheng fullname: Cheng, Yukun organization: Department of Physics, National Taiwan Normal University, Taipei, 116 Taiwan, ROC – sequence: 3 givenname: Jyun-Bi surname: Wang fullname: Wang, Jyun-Bi organization: Graduate Institute of Electro-Optical Engineering and Department of Electrical Engineering, College of Electrical Engineering, National Taiwan University, Taipei, 106-17 Taiwan, ROC – sequence: 4 givenname: Zhe surname: Chuan Feng fullname: Chuan Feng, Zhe email: zcfeng@cc.ee.ntu.edu.tw organization: Graduate Institute of Electro-Optical Engineering and Department of Electrical Engineering, College of Electrical Engineering, National Taiwan University, Taipei, 106-17 Taiwan, ROC |
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Cites_doi | 10.1109/T-ED.1980.20166 10.1103/PhysRevB.60.16058 10.1063/1.1389331 10.1063/1.362472 10.1063/1.103354 10.1016/0038-1098(93)90611-P 10.1080/01418639408240221 10.1016/0022-0248(92)90473-V 10.1088/0268-1242/6/3/001 10.1063/1.125826 10.1116/1.1699340 10.1063/1.112384 10.1063/1.95640 10.1016/S0022-0248(01)01919-4 10.1063/1.1748850 10.1007/BF02655217 10.1063/1.347033 10.1016/0022-0248(92)90487-4 |
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Keywords | Characterization Metalorganic chemical vapor deposition (MOCVD) GaAs InSb Fourier transfer infrared spectroscopy Inorganic compounds Indium antimonides Binary compounds Crystal growth from vapors Experimental study MOCVD Far infrared spectrum Thin films CVD Thickness Reflectivity Phonon mode Vibrational modes Effective mass Carrier mobility Permittivity Carrier density III-V semiconductors |
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SubjectTerms | Characterization Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science; rheology Exact sciences and technology Fourier transfer infrared spectroscopy GaAs InSb Materials science Metalorganic chemical vapor deposition (MOCVD) Methods of deposition of films and coatings; film growth and epitaxy Physics |
Title | Optical and transport properties of InSb thin films grown on GaAs by metalorganic chemical vapor deposition |
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