APA (7th ed.) Citation

Xiang, C., Yang, Y., & Penner, R. M. (2009). Cheating the diffraction limit: Electrodeposited nanowires patterned by photolithography. Chemical communications (Cambridge, England), 8, 859-873. https://doi.org/10.1039/b815603d

Chicago Style (17th ed.) Citation

Xiang, Chengxiang, Yongan Yang, and Reginald M. Penner. "Cheating the Diffraction Limit: Electrodeposited Nanowires Patterned by Photolithography." Chemical Communications (Cambridge, England) 8 (2009): 859-873. https://doi.org/10.1039/b815603d.

MLA (9th ed.) Citation

Xiang, Chengxiang, et al. "Cheating the Diffraction Limit: Electrodeposited Nanowires Patterned by Photolithography." Chemical Communications (Cambridge, England), 8, 2009, pp. 859-873, https://doi.org/10.1039/b815603d.