Machine-aligned fabrication of submicron SIS tunnel junctions using a focused ion beam

• Published in: IEEE transactions on applied superconductivity Vol. 9; no. 2; pp. 3240 - 3243
• Main Authors: Bass, R.B., Zhang, J.Z., Lichtenberger, A.W.
• Format: Journal Article Conference Proceeding
• Language: English
• Published: New York, NY IEEE 01.06.1999; Institute of Electrical and Electronics Engineers
• Subjects: Applied sciences; Circuits; Computers, microcomputers; Electron beam lithography; Electron beams; Electronics; Exact sciences and technology; Fabrication; Hardware; Insulation; Ion beams; Josephson junctions; Niobium; Quantum computing; Resists; Superconducting devices; Superconductivity; Tunnel junctions; Wiring; Circuit design; Electron beam lithography; Manufacturing process; Submicrometer; Quantum computer; Quantum coherence; Superconducting quantum interferometer device; Tunnel junction; Superconducting junction; Spot size; Self aligned technology

The objective of our research is to develop a machine-aligned technique for the definition and insulation of Nb/Al-AlO/sub x//Nb superconducting-insulating-superconducting (SIS) tunnel junctions with areas as small as 0.2 /spl mu/m/sup 2/. The fabrication of such ultrasmall area planar SIS junctions...