The Lithographic Performance and Contamination Resistance of a New Family of Chemically Amplified DUV Photoresists

• Published in: Journal of Photopolymer Science and Technology Vol. 7; no. 3; pp. 449 - 460
• Main Authors: Breyta, Greg, Hofer, Donald C., Ito, Hiroshi, Seeger, Dave, Petrillo, Karen, Moritz, Holger, Fischer, Thomas
• Format: Journal Article
• Language: English
• Published: Hiratsuka The Society of Photopolymer Science and Technology(SPST) 1994; Japan Science and Technology Agency

A new contamination resistant 248nm DUV resist (ESCAP-E) has been developed to alleviate the difficulties encountered with the environmental contamination sensitivity of chemically amplified DUV photoresists. The formulation and processing of ESCAP-I; have been designed to permit thermal annealing o...