Large-Area 3D Nanostructures with Octagonal Quasicrystalline Symmetry via Phase-Mask Lithography
3D nanostructured quasicrystalline materials significantly larger than feasible with previously reported techniques are produced. 2D quasiperiodic surface relief templates with 8mm point group symmetry are made by multiple‐exposure interference lithography. Phase‐mask lithography with corresponding...
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| Published in | Advanced materials (Weinheim) Vol. 19; no. 10; pp. 1403 - 1407 |
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| Main Authors | , , , , |
| Format | Journal Article |
| Language | English |
| Published |
Weinheim
WILEY-VCH Verlag
21.05.2007
WILEY‐VCH Verlag |
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| Abstract | 3D nanostructured quasicrystalline materials significantly larger than feasible with previously reported techniques are produced. 2D quasiperiodic surface relief templates with 8mm point group symmetry are made by multiple‐exposure interference lithography. Phase‐mask lithography with corresponding PDMS masks produce bicontinuous 3D axial quasicrystal SU‐8 structures (see figure). |
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| AbstractList | 3D nanostructured quasicrystalline materials significantly larger than feasible with previously reported techniques are produced. 2D quasiperiodic surface relief templates with 8mm point group symmetry are made by multiple‐exposure interference lithography. Phase‐mask lithography with corresponding PDMS masks produce bicontinuous 3D axial quasicrystal SU‐8 structures (see figure). |
| Author | Choi, T. Bita, I. Walsh, M. E. Smith, H. I. Thomas, E. L. |
| Author_xml | – sequence: 1 givenname: I. surname: Bita fullname: Bita, I. email: ibita@alum.mit.edu organization: Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139 (USA) – sequence: 2 givenname: T. surname: Choi fullname: Choi, T. organization: Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139 (USA) – sequence: 3 givenname: M. E. surname: Walsh fullname: Walsh, M. E. organization: Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139 (USA) – sequence: 4 givenname: H. I. surname: Smith fullname: Smith, H. I. organization: Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139 (USA) – sequence: 5 givenname: E. L. surname: Thomas fullname: Thomas, E. L. email: elt@mit.edu organization: Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139 (USA) |
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| Cites_doi | 10.1103/PhysRevA.60.R4233 10.1002/adma.200305263 10.1038/nmat1786 10.1103/PhysRevLett.58.2059 10.1038/35003523 10.1038/35008023 10.1103/PhysRevLett.92.123906 10.1103/PhysRevLett.53.1951 10.1364/OE.14.010746 10.1103/PhysRevLett.70.2249 10.1016/j.jphotochem.2004.04.035 10.1073/pnas.0403048101 10.1103/PhysRevLett.59.1010 10.1126/science.249.4970.749 10.1063/1.2168487 10.1103/PhysRevLett.53.2477 10.1103/RevModPhys.63.699 10.1103/PhysRevLett.80.956 10.1038/nature03977 10.1146/annurev.matsci.28.1.153 10.1364/OPEX.12.000990 |
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| Notes | We thank Dr. J. Yoon for assistance with confocal microscopy. This work was partially supported by the MRSEC program of the National Science Foundation under award number DMR 02-13282, by a Division of Materials Research Polymer Program NSF grant DMR-0308133 to ELT, and further partially supported by the U.S. Army Research Office through the Institute for Soldier Nanotechnologies, under Contract DAAD-19-02D-0002. U.S. Army Research Office - No. DAAD-19-02D-0002 National Science Foundation - No. DMR 02-13282 NSF - No. DMR-0308133 istex:B8DEDFA6A90A2492DC421C0B3347DC5A8B36F2A3 ark:/67375/WNG-B6XFLD03-0 ArticleID:ADMA200700178 We thank Dr. J. Yoon for assistance with confocal microscopy. This work was partially supported by the MRSEC program of the National Science Foundation under award number DMR 02‐13282, by a Division of Materials Research Polymer Program NSF grant DMR‐0308133 to ELT, and further partially supported by the U.S. Army Research Office through the Institute for Soldier Nanotechnologies, under Contract DAAD‐19‐02D‐0002. ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
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| SubjectTerms | Lithography metal Nanostructures Nanostructures, metal Photonic materials Silica Template-directed assembly |
| Title | Large-Area 3D Nanostructures with Octagonal Quasicrystalline Symmetry via Phase-Mask Lithography |
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