Large-Area 3D Nanostructures with Octagonal Quasicrystalline Symmetry via Phase-Mask Lithography

3D nanostructured quasicrystalline materials significantly larger than feasible with previously reported techniques are produced. 2D quasiperiodic surface relief templates with 8mm point group symmetry are made by multiple‐exposure interference lithography. Phase‐mask lithography with corresponding...

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Published inAdvanced materials (Weinheim) Vol. 19; no. 10; pp. 1403 - 1407
Main Authors Bita, I., Choi, T., Walsh, M. E., Smith, H. I., Thomas, E. L.
Format Journal Article
LanguageEnglish
Published Weinheim WILEY-VCH Verlag 21.05.2007
WILEY‐VCH Verlag
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Summary:3D nanostructured quasicrystalline materials significantly larger than feasible with previously reported techniques are produced. 2D quasiperiodic surface relief templates with 8mm point group symmetry are made by multiple‐exposure interference lithography. Phase‐mask lithography with corresponding PDMS masks produce bicontinuous 3D axial quasicrystal SU‐8 structures (see figure).
Bibliography:We thank Dr. J. Yoon for assistance with confocal microscopy. This work was partially supported by the MRSEC program of the National Science Foundation under award number DMR 02-13282, by a Division of Materials Research Polymer Program NSF grant DMR-0308133 to ELT, and further partially supported by the U.S. Army Research Office through the Institute for Soldier Nanotechnologies, under Contract DAAD-19-02D-0002.
U.S. Army Research Office - No. DAAD-19-02D-0002
National Science Foundation - No. DMR 02-13282
NSF - No. DMR-0308133
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ArticleID:ADMA200700178
We thank Dr. J. Yoon for assistance with confocal microscopy. This work was partially supported by the MRSEC program of the National Science Foundation under award number DMR 02‐13282, by a Division of Materials Research Polymer Program NSF grant DMR‐0308133 to ELT, and further partially supported by the U.S. Army Research Office through the Institute for Soldier Nanotechnologies, under Contract DAAD‐19‐02D‐0002.
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ISSN:0935-9648
1521-4095
DOI:10.1002/adma.200700178