APA (7th ed.) Citation

Ding, B., Yu, X., Lu, H., Xiu, X., Zhang, C., Yang, C., . . . Huo, Y. (2019). Third-order optical nonlinearity in silicon nitride films prepared using magnetron sputtering and application for optical bistability. Journal of applied physics, 125(11), . https://doi.org/10.1063/1.5085234

Chicago Style (17th ed.) Citation

Ding, Baoyong, et al. "Third-order Optical Nonlinearity in Silicon Nitride Films Prepared Using Magnetron Sputtering and Application for Optical Bistability." Journal of Applied Physics 125, no. 11 (2019). https://doi.org/10.1063/1.5085234.

MLA (9th ed.) Citation

Ding, Baoyong, et al. "Third-order Optical Nonlinearity in Silicon Nitride Films Prepared Using Magnetron Sputtering and Application for Optical Bistability." Journal of Applied Physics, vol. 125, no. 11, 2019, https://doi.org/10.1063/1.5085234.