Mechanical properties of amorphous and microcrystalline silicon films

• Published in: Thin solid films Vol. 516; no. 16; pp. 5368 - 5375
• Main Authors: Kulikovsky, V., Vorlíček, V., Boháč, P., Stranyánek, M., Čtvrtlík, R., Kurdyumov, A.
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Lausanne Elsevier B.V 30.06.2008; Elsevier Science
• Subjects: a-Si films; Compressive stress; Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Deposition by sputtering; Elastic modulus; Exact sciences and technology; Hardness; Materials science; Mechanical and acoustical properties; Methods of deposition of films and coatings; film growth and epitaxy; Physical properties of thin films, nonelectronic; Physics; Raman spectra; Structure and morphology; thickness; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thin film structure and morphology; Elastic modulus; Raman spectra; Compressive stress; a-Si films; Hardness; Vacuum annealing; Phase transformations; Electron diffraction; Mechanical properties; Raman spectroscopy; Layer thickness; Indentation; Thin films; Cathode sputtering; Physical vapor deposition; Stress effects; Silicon; Sputter deposition; Microstructure; Crystal structure

Hydrogen-free amorphous silicon (a-Si) films with thickness of 4.5–6.5 μm were prepared by magnetron sputtering of pure silicon. Mechanical properties (hardness, intrinsic stress, elastic modulus), and film structure (Raman spectra, electron diffraction) were investigated in dependence on the substr...