APA (7th ed.) Citation

Zhang, S., Xia, S., Cao, Q., Wang, D., Liu, R., & Du, Y. (2019). Observation of topological Hall effect in antiferromagnetic FeRh film. Applied physics letters, 115(2), . https://doi.org/10.1063/1.5099183

Chicago Style (17th ed.) Citation

Zhang, Sheng, Siyu Xia, Qingqi Cao, Dunhui Wang, Ronghua Liu, and Youwei Du. "Observation of Topological Hall Effect in Antiferromagnetic FeRh Film." Applied Physics Letters 115, no. 2 (2019). https://doi.org/10.1063/1.5099183.

MLA (9th ed.) Citation

Zhang, Sheng, et al. "Observation of Topological Hall Effect in Antiferromagnetic FeRh Film." Applied Physics Letters, vol. 115, no. 2, 2019, https://doi.org/10.1063/1.5099183.