Silicon-doped hafnium oxide anti-ferroelectric thin films for energy storage - Ali, Faizan; Liu, Xiaohua; Zhou, Dayu; Yang, Xirui; Xu, Jin; Schenk, Tony; Müller, Johannes; Schroeder, Uwe; Cao, Fei; Dong, Xianlin (Journal of applied physics, 2017)
Keywords: Aluminum oxide; Antiferroelectricity; Applied physics; Electronic devices; Electrostatic discharges; Endurance; Energy; Energy storage; Ferroelectric materials; Hafnium oxide; Induced polarization; Silicon; Thermal stability; Thin films