APA (7th ed.) Citation

Ali, F., Liu, X., Zhou, D., Yang, X., Xu, J., Schenk, T., . . . Dong, X. (2017). Silicon-doped hafnium oxide anti-ferroelectric thin films for energy storage. Journal of applied physics, 122(14), . https://doi.org/10.1063/1.4989908

Chicago Style (17th ed.) Citation

Ali, Faizan, et al. "Silicon-doped Hafnium Oxide Anti-ferroelectric Thin Films for Energy Storage." Journal of Applied Physics 122, no. 14 (2017). https://doi.org/10.1063/1.4989908.

MLA (9th ed.) Citation

Ali, Faizan, et al. "Silicon-doped Hafnium Oxide Anti-ferroelectric Thin Films for Energy Storage." Journal of Applied Physics, vol. 122, no. 14, 2017, https://doi.org/10.1063/1.4989908.