Pyroelectric dependence of atomic layer-deposited Hf0.5Zr0.5O2 on film thickness and annealing temperature - Lomenzo, Patrick D.; Alcala, Ruben; Richter, Claudia; Li, Songrui; Mikolajick, Thomas; Schroeder, Uwe (Applied physics letters, 2021)
Keywords: Annealing; Applied physics; Coefficients; Crystallization; Depolarization; Energy harvesting; Ferroelectric materials; Ferroelectricity; Film thickness; Materials selection; Metallizing