Advanced high-pressure plasma diagnostics with hairpin resonator probe surrounded by film and sheath

The hairpin probe using microwave resonance in plasma is applicable to high pressure 1.33 ×10^3-1.01×10^5 Pa）） as developed recently. In this work, an analytic model of the hairpin resonator probe surrounded by a thin dielectric layer and a sheath layer is proposed. The correction factor due to thes...

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Bibliographic Details
Published inChinese physics B Vol. 19; no. 7; pp. 387 - 393
Main Author 徐金洲 石建军 张菁 张琪 中村圭二 菅井秀郎
Format Journal Article
LanguageEnglish
Published IOP Publishing 01.07.2010
Subjects
Electromagnetic fields
Electron density
Mathematical analysis
Microwave resonance
Plasma (physics)
Resonators
Sheaths
Thin films
均匀放电
探针分析
有限差分模拟
环境因素
等离子体共振
等离子体诊断
高压腔
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Summary:The hairpin probe using microwave resonance in plasma is applicable to high pressure 1.33 ×10^3-1.01×10^5 Pa）） as developed recently. In this work, an analytic model of the hairpin resonator probe surrounded by a thin dielectric layer and a sheath layer is proposed. The correction factor due to these surroundings is analytically found and confirmed by electromagnetic field finite difference time domain simulation, thus enabling the accurate measurement of electron density in a high-pressure non-equilibrium uniform discharge.
Bibliography:hairpin resonator probe, simulation, high-pressure plasma, transmission line model
TN912.15
11-5639/O4
P574.2
ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:1674-1056
2058-3834
DOI:10.1088/1674-1056/19/7/075206