Investigation of d.c.-reactive magnetron-sputtered AlN thin films by electron microprobe analysis, X-ray photoelectron spectroscopy and polarised infra-red reflection

• Published in: Surface & coatings technology Vol. 106; no. 2; pp. 205 - 208
• Main Authors: Manova, D., Dimitrova, V., Fukarek, W., Karpuzov, D.
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 04.08.1998
• Subjects: AlN; d.c. magnetron sputtering; Electron microprobe analysis; Polarised infra-red reflection; X-ray photoelectron spectroscopy; Polarised infra-red reflection; AlN; d.c. magnetron sputtering; Electron microprobe analysis; X-ray photoelectron spectroscopy

Thin films of AlN were deposited at a total gas pressure of 7×10 −4 mbar and a nitrogen partial presure of 9×10 −5 mbar by reactive d.c. magnetron sputtering. Low-carbon steel 08KP, Si (100) wafers and monocrystal KCl were used as substrates. Electron microprobe analysis (EMA), X-ray photoelectron s...