Interface-Induced Plasmon Nonhomogeneity in Nanostructured Metal-Dielectric Planar Metamaterial

Transformations of the electronic structure in thin silver layers in metal-dielectric (TiAlN/Ag) multilayer nanocomposite were investigated by a set of electron spectroscopy techniques. Localization of the electronic states in the valence band and reduction of electron concentration in the conductio...

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Bibliographic Details
Published inJournal of nanomaterials Vol. 2015; no. 2015; pp. 1 - 9
Main Authors Fox-Rabinovich, G. S., Soldera, F., Gago, R., Rashkovskiy, A. Yu, Wainstein, D. L., Kovalev, A. I., Endrino, J. L.
Format Journal Article
LanguageEnglish
Published Cairo, Egypt Hindawi Publishing Corporation 01.01.2015
Hindawi Limited
Subjects
Augers
Localization
Mechanical engineering
Metamaterials
Microscopy
Nanomaterials
Nanostructure
Plasmons
Position (location)
Propagation
Scanning electron microscopy
Silver
Spectrum analysis
Thin films
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Summary:Transformations of the electronic structure in thin silver layers in metal-dielectric (TiAlN/Ag) multilayer nanocomposite were investigated by a set of electron spectroscopy techniques. Localization of the electronic states in the valence band and reduction of electron concentration in the conduction band was observed. This led to decreasing metallic properties of silver in the thin films. A critical layer thickness of 23.5 nm associated with the development of quantum effects was determined by X-ray photoelectron spectroscopy. Scanning Auger electron microscopy of characteristic energy losses provided images of plasmon localization in the Ag layers. The nonuniformity of plasmon intensities distribution near the metal-nitride interfaces was assessed experimentally.
Bibliography:ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:1687-4110
1687-4129
DOI:10.1155/2015/876247