Diblock copolymer pattern protection by silver cluster reinforcement

Pattern fabrication by self-assembly of diblock copolymers is of significant interest due to the simplicity in fabricating complex structures. In particular, polystyrene- block -poly-4-vinylpyridine (PS- b -P4VP) is a fascinating base material as it forms an ordered micellar structure on silicon sur...

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Published inNanoscale Vol. 15; no. 38; pp. 15768 - 15774
Main Authors Bulut, Yusuf, Sochor, Benedikt, Harder, Constantin, Reck, Kristian, Drewes, Jonas, Xu, Zhuijun, Jiang, Xiongzhuo, Meinhardt, Alexander, Jeromin, Arno, Kohantorabi, Mona, Noei, Heshmat, Keller, Thomas F, Strunskus, Thomas, Faupel, Franz, Müller-Buschbaum, Peter, Roth, Stephan V
Format Journal Article
LanguageEnglish
Published Cambridge Royal Society of Chemistry 05.10.2023
Subjects
Block copolymers
Deposition
Direct current
Emission analysis
Field emission microscopy
Polystyrene resins
Polyvinyl pyridine
Self-assembly
Silver
X-ray scattering
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Abstract Pattern fabrication by self-assembly of diblock copolymers is of significant interest due to the simplicity in fabricating complex structures. In particular, polystyrene- block -poly-4-vinylpyridine (PS- b -P4VP) is a fascinating base material as it forms an ordered micellar structure on silicon surfaces. In this work, silver (Ag) is applied using direct current magnetron sputter deposition and high-power impulse magnetron sputter deposition on an ordered micellar PS- b -P4VP layer. The fabricated hybrid materials are structurally analyzed by field emission scanning electron microscopy, atomic force microscopy, and grazing incidence small angle X-ray scattering. When applying simple aqueous posttreatment, the pattern is stable and reinforced by Ag clusters, making micellar PS- b -P4VP ordered layers ideal candidates for lithography. The pristine micellar pattern of the diblock copolymer PS- b -P4VP degrades upon drying of a water droplet, which can be stabilized and inhibited upon deposition of silver clusters.
AbstractList Pattern fabrication by self-assembly of diblock copolymers is of significant interest due to the simplicity in fabricating complex structures. In particular, polystyrene- block -poly-4-vinylpyridine (PS- b -P4VP) is a fascinating base material as it forms an ordered micellar structure on silicon surfaces. In this work, silver (Ag) is applied using direct current magnetron sputter deposition and high-power impulse magnetron sputter deposition on an ordered micellar PS- b -P4VP layer. The fabricated hybrid materials are structurally analyzed by field emission scanning electron microscopy, atomic force microscopy, and grazing incidence small angle X-ray scattering. When applying simple aqueous posttreatment, the pattern is stable and reinforced by Ag clusters, making micellar PS- b -P4VP ordered layers ideal candidates for lithography.
Pattern fabrication by self-assembly of diblock copolymers is of significant interest due to the simplicity in fabricating complex structures. In particular, polystyrene-block-poly-4-vinylpyridine (PS-b-P4VP) is a fascinating base material as it forms an ordered micellar structure on silicon surfaces. In this work, silver (Ag) is applied using direct current magnetron sputter deposition and high-power impulse magnetron sputter deposition on an ordered micellar PS-b-P4VP layer. The fabricated hybrid materials are structurally analyzed by field emission scanning electron microscopy, atomic force microscopy, and grazing incidence small angle X-ray scattering. When applying simple aqueous posttreatment, the pattern is stable and reinforced by Ag clusters, making micellar PS-b-P4VP ordered layers ideal candidates for lithography.
Pattern fabrication by self-assembly of diblock copolymers is of significant interest due to the simplicity in fabricating complex structures. In particular, polystyrene- block -poly-4-vinylpyridine (PS- b -P4VP) is a fascinating base material as it forms an ordered micellar structure on silicon surfaces. In this work, silver (Ag) is applied using direct current magnetron sputter deposition and high-power impulse magnetron sputter deposition on an ordered micellar PS- b -P4VP layer. The fabricated hybrid materials are structurally analyzed by field emission scanning electron microscopy, atomic force microscopy, and grazing incidence small angle X-ray scattering. When applying simple aqueous posttreatment, the pattern is stable and reinforced by Ag clusters, making micellar PS- b -P4VP ordered layers ideal candidates for lithography. The pristine micellar pattern of the diblock copolymer PS- b -P4VP degrades upon drying of a water droplet, which can be stabilized and inhibited upon deposition of silver clusters.
Pattern fabrication by self-assembly of diblock copolymers is of significant interest due to the simplicity in fabricating complex structures. In particular, polystyrene-block-poly-4-vinylpyridine (PS-b-P4VP) is a fascinating base material as it forms an ordered micellar structure on silicon surfaces. In this work, silver (Ag) is applied using direct current magnetron sputter deposition and high-power impulse magnetron sputter deposition on an ordered micellar PS-b-P4VP layer. The fabricated hybrid materials are structurally analyzed by field emission scanning electron microscopy, atomic force microscopy, and grazing incidence small angle X-ray scattering. When applying simple aqueous posttreatment, the pattern is stable and reinforced by Ag clusters, making micellar PS-b-P4VP ordered layers ideal candidates for lithography.Pattern fabrication by self-assembly of diblock copolymers is of significant interest due to the simplicity in fabricating complex structures. In particular, polystyrene-block-poly-4-vinylpyridine (PS-b-P4VP) is a fascinating base material as it forms an ordered micellar structure on silicon surfaces. In this work, silver (Ag) is applied using direct current magnetron sputter deposition and high-power impulse magnetron sputter deposition on an ordered micellar PS-b-P4VP layer. The fabricated hybrid materials are structurally analyzed by field emission scanning electron microscopy, atomic force microscopy, and grazing incidence small angle X-ray scattering. When applying simple aqueous posttreatment, the pattern is stable and reinforced by Ag clusters, making micellar PS-b-P4VP ordered layers ideal candidates for lithography.
Pattern fabrication by self-assembly of diblock copolymers is of significant interest due to the simplicity in fabricating complex structures. In particular, polystyrene-block-poly-4-vinylpyridine (PS-b-P4VP) is a fascinating base material as it forms an ordered micellar structure on silicon surfaces. In this work, silver (Ag) is applied using direct current magnetron sputter deposition and high-power impulse magnetron sputter deposition on an ordered micellar PS-b-P4VP layer. The fabricated hybrid materials are structurally analyzed by field emission scanning electron microscopy, atomic force microscopy, and grazing incidence small angle X-ray scattering. When applying simple aqueous posttreatment, the pattern is stable and reinforced by Ag clusters, making micellar PS-b-P4VP ordered layers ideal candidates for lithography. The pristine micellar pattern of the diblock copolymer PS-b-P4VP degrades upon drying of a water droplet, which can be stabilized and inhibited upon deposition of silver clusters.
Author Noei, Heshmat
Harder, Constantin
Müller-Buschbaum, Peter
Strunskus, Thomas
Keller, Thomas F
Jeromin, Arno
Reck, Kristian
Kohantorabi, Mona
Sochor, Benedikt
Xu, Zhuijun
Jiang, Xiongzhuo
Faupel, Franz
Meinhardt, Alexander
Roth, Stephan V
Bulut, Yusuf
Drewes, Jonas
AuthorAffiliation Technical University of Munich
Chair for Functional Materials
Centre for X-ray and Nano Science CXNS
KTH Royal Institute of Technology
Deutsches Elektronen-Synchrotron DESY
Christian-Albrechts Universität zu Kiel
Department of Physics
Technische Universität München
Chair for Multicomponent Materials
Faculty of Engineering
Deutsches Elektronen-Synchtrotron DESY
Department of Materials Science
TUM School of Natural Sciences
University of Hamburg
Heinz Maier-Leibnitz Zentrum (MLZ)
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Snippet Pattern fabrication by self-assembly of diblock copolymers is of significant interest due to the simplicity in fabricating complex structures. In particular,...
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SubjectTerms Block copolymers
Deposition
Direct current
Emission analysis
Field emission microscopy
Polystyrene resins
Polyvinyl pyridine
Self-assembly
Silver
X-ray scattering
Title Diblock copolymer pattern protection by silver cluster reinforcement
URI https://www.proquest.com/docview/2872683790
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https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-338743
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