Stitching error analysis in an electron beam lithography system : column vibration effect

• Published in: JPN J APPL PHYS PART 1 REGUL PAP SHORT NOTE REV PAP Vol. 32; no. 12B; pp. 6044 - 6048
• Main Authors: OHTA, H, MATSUZAKA, T, SAITOU, N, KAWASAKI, K, KOHNO, T, HOGA, M
• Format: Conference Proceeding Journal Article
• Language: English
• Published: Tokyo Japanese journal of applied physics 01.12.1993
• Subjects: Applied sciences; Electronics; Exact sciences and technology; Microelectronic fabrication (materials and surfaces technology); Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; Microelectronic fabrication; Error analysis; Modal analysis; Electron beam lithography; Integrated circuit

The column vibration effects on field stitching accuracy in an electron beam lithography system are investigated. Field stitching error analysis shows that beam placement error caused by column vibration is about 0.04 µm. This corresponds to 80% of the required accuracy for 0.3-µm ULSIs. In this stu...