APA (7th ed.) Citation

Gocalinska, A., Pescaglini, A., Secco, E., Mura, E. E., Thomas, K., Curran, A., . . . Pelucchi, E. (2020). Next generation low temperature polycrystalline materials for above IC electronics. High mobility n- and p-type III-V metalorganic vapour phase epitaxy thin films on amorphous substrates. JPhys photonics, 2(2), 25003-25017. https://doi.org/10.1088/2515-7647/ab7557

Chicago Style (17th ed.) Citation

Gocalinska, Agnieszka, et al. "Next Generation Low Temperature Polycrystalline Materials for Above IC Electronics. High Mobility N- and P-type III-V Metalorganic Vapour Phase Epitaxy Thin Films on Amorphous Substrates." JPhys Photonics 2, no. 2 (2020): 25003-25017. https://doi.org/10.1088/2515-7647/ab7557.

MLA (9th ed.) Citation

Gocalinska, Agnieszka, et al. "Next Generation Low Temperature Polycrystalline Materials for Above IC Electronics. High Mobility N- and P-type III-V Metalorganic Vapour Phase Epitaxy Thin Films on Amorphous Substrates." JPhys Photonics, vol. 2, no. 2, 2020, pp. 25003-25017, https://doi.org/10.1088/2515-7647/ab7557.