Electrochromic performance of reactive plasma-sputtered NiOx thin films on flexible PET/ITO substrates for flexible electrochromic devices

• Published in: Surface & coatings technology Vol. 205; pp. S216 - S221
• Main Authors: Lin, Yung-Sen, Chen, Po-Wen, Lin, Di-Jiun, Chuang, Pei-Ying, Tsai, Tsung-Hsien, Shiah, Yui-Chuin, Yu, Yueh-Chung
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Amsterdam Elsevier 25.12.2010
• Subjects: Applied sciences; Cross-disciplinary physics: materials science; rheology; Devices; Driving; Electric potential; Electrochromism; Exact sciences and technology; Indium tin oxide; Intercalation; Materials science; Metals. Metallurgy; Methods of deposition of films and coatings; film growth and epitaxy; Nickel; Physics; Polyethylene terephthalates; Production techniques; Surface treatment; Surface treatments; Thin films; Thin films; Cyclic voltammetry; Plasma; Flexible substrate; Surface treatments; Electrochromism; Nickel oxide; Sputtering; Sputter

Electrochromic properties of NiOx (nickel oxide) thin films sputtered on 40I[copy/a-! flexible PET (polyethylene terephthalate)/ITO (indium tin oxide) substrates were investigated. Metallic Ni target, sputtered by radio frequency (r.f.) power with argon gases and reacted with oxygen gases at room te...