APA (7th ed.) Citation

Lin, Y., Chen, P., Lin, D., Chuang, P., Tsai, T., Shiah, Y., & Yu, Y. (2010). Electrochromic performance of reactive plasma-sputtered NiOx thin films on flexible PET/ITO substrates for flexible electrochromic devices. Surface & coatings technology, 205, S216-S221. https://doi.org/10.1016/j.surfcoat.2010.07.088

Chicago Style (17th ed.) Citation

Lin, Yung-Sen, Po-Wen Chen, Di-Jiun Lin, Pei-Ying Chuang, Tsung-Hsien Tsai, Yui-Chuin Shiah, and Yueh-Chung Yu. "Electrochromic Performance of Reactive Plasma-sputtered NiOx Thin Films on Flexible PET/ITO Substrates for Flexible Electrochromic Devices." Surface & Coatings Technology 205 (2010): S216-S221. https://doi.org/10.1016/j.surfcoat.2010.07.088.

MLA (9th ed.) Citation

Lin, Yung-Sen, et al. "Electrochromic Performance of Reactive Plasma-sputtered NiOx Thin Films on Flexible PET/ITO Substrates for Flexible Electrochromic Devices." Surface & Coatings Technology, vol. 205, 2010, pp. S216-S221, https://doi.org/10.1016/j.surfcoat.2010.07.088.