Anomalous thermoelectricity of pure ZnO from 3D continuous ultrathin nanoshell structures
ZnO is a potential thermoelectric material because of its non-toxicity, high thermal stability, and relatively high Seebeck coefficient (S) of metal oxides. However, the extremely low figure of merit (zT), which comes from a high thermal conductivity (κ) over 40 W m K , limits the thermoelectric app...
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Published in | Nanoscale Vol. 10; no. 6; pp. 3046 - 3052 |
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Main Authors | , , , , , , , |
Format | Journal Article |
Language | English |
Published |
England
Royal Society of Chemistry
01.01.2018
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Subjects | |
Online Access | Get full text |
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Summary: | ZnO is a potential thermoelectric material because of its non-toxicity, high thermal stability, and relatively high Seebeck coefficient (S) of metal oxides. However, the extremely low figure of merit (zT), which comes from a high thermal conductivity (κ) over 40 W m
K
, limits the thermoelectric application of ZnO. In particular, below 500 K, ZnO exhibits a nearly negligible zT (<10
), unless a dopant is incorporated into the crystal structure. Here, we propose a new strategy for achieving a reduced κ and a correspondingly increased zT of pure ZnO over a wide temperature range from 333 K to 723 K by forming an ∼72 nm thick, 3D continuous ultrathin nanoshell structure. The suppressed κ of the 3D ZnO film is ∼3.6 W m
K
at 333 K, which is ∼38 times lower than that of the blanket ZnO film (3.2 μm thick), which was set as a reference. The experimental zT of the 3D ZnO film is ∼0.017 at 333 K, which is the highest value among pure ZnO reported to date and is estimated to increase by ∼0.072 at 693 K according to the Debye-Callaway approach. Large-area (∼1 in
) fabrication of the 3D ZnO film with high structural uniformity allows the realization of an integrated thermoelectric device, which generates ∼60 mV at a temperature difference of 40 K along the in-plane direction. |
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ISSN: | 2040-3364 2040-3372 |
DOI: | 10.1039/c7nr08167g |