Zhou, Y., Zhang, Y., Yang, Q., Jiang, J., Fan, P., Liao, M., & Zhou, Y. (2019). The effects of oxygen vacancies on ferroelectric phase transition of HfO2-based thin film from first-principle. Computational materials science, 167, 143-150. https://doi.org/10.1016/j.commatsci.2019.05.041
Chicago Style (17th ed.) CitationZhou, Y., Y.K Zhang, Q. Yang, J. Jiang, P. Fan, M. Liao, and Y.C Zhou. "The Effects of Oxygen Vacancies on Ferroelectric Phase Transition of HfO2-based Thin Film from First-principle." Computational Materials Science 167 (2019): 143-150. https://doi.org/10.1016/j.commatsci.2019.05.041.
MLA (9th ed.) CitationZhou, Y., et al. "The Effects of Oxygen Vacancies on Ferroelectric Phase Transition of HfO2-based Thin Film from First-principle." Computational Materials Science, vol. 167, 2019, pp. 143-150, https://doi.org/10.1016/j.commatsci.2019.05.041.