Insight of surface treatments for CMOS compatibility of InAs nanowires
A CMOS compatible process is presented in order to grow self-catalyzed InAs nanowires on silicon by molecular beam epitaxy. The crucial step of this process is a new in-situ surface preparation under hydrogen (gas or plasma) during the substrate degassing combined with an in-situ arsenic annealing p...
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Published in | Nano research Vol. 12; no. 3; pp. 581 - 586 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
Beijing
Tsinghua University Press
01.03.2019
Springer Nature B.V Springer |
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Abstract | A CMOS compatible process is presented in order to grow self-catalyzed InAs nanowires on silicon by molecular beam epitaxy. The crucial step of this process is a new
in-situ
surface preparation under hydrogen (gas or plasma) during the substrate degassing combined with an
in-situ
arsenic annealing prior to growth. Morphological and structural characterizations of the InAs nanowires are presented and growth mechanisms are discussed in detail. The major influence of surface termination is exposed both experimentally and theoretically using statistics on ensemble of nanowires and density functional theory (DFT) calculations. The differences observed between Molecular Beam Epitaxy (MBE) and Metal Organic Vapor Phase Epitaxy (MOVPE) growth of InAs nanowires can be explained by these different surfaces terminations. The transition between a vapor solid (VS) and a vapor liquid solid (VLS) growth mechanism is presented. Optimized growth conditions lead to very high aspect ratio nanowires (up to 50 nm in diameter and 3 micron in length) without passing the 410 °C thermal limit, which makes the whole process CMOS compatible. Overall, our results suggest a new method for surface preparation and a possible tuning of the growth mechanism using different surface terminations. |
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AbstractList | A CMOS compatible process is presented in order to grow self-catalyzed InAs nanowires on silicon by molecular beam epitaxy. The crucial step of this process is a new
in-situ
surface preparation under hydrogen (gas or plasma) during the substrate degassing combined with an
in-situ
arsenic annealing prior to growth. Morphological and structural characterizations of the InAs nanowires are presented and growth mechanisms are discussed in detail. The major influence of surface termination is exposed both experimentally and theoretically using statistics on ensemble of nanowires and density functional theory (DFT) calculations. The differences observed between Molecular Beam Epitaxy (MBE) and Metal Organic Vapor Phase Epitaxy (MOVPE) growth of InAs nanowires can be explained by these different surfaces terminations. The transition between a vapor solid (VS) and a vapor liquid solid (VLS) growth mechanism is presented. Optimized growth conditions lead to very high aspect ratio nanowires (up to 50 nm in diameter and 3 micron in length) without passing the 410 °C thermal limit, which makes the whole process CMOS compatible. Overall, our results suggest a new method for surface preparation and a possible tuning of the growth mechanism using different surface terminations. A CMOS compatible process is presented in order to grow self-catalyzed InAs nanowires on silicon by molecular beam epitaxy. The crucial step of this process is a new in-situ surface preparation under hydrogen (gas or plasma) during the substrate degassing combined with an in-situ arsenic annealing prior to growth. Morphological and structural characterizations of the InAs nanowires are presented and growth mechanisms are discussed in detail. The major influence of surface termination is exposed both experimentally and theoretically using statistics on ensemble of nanowires and density functional theory (DFT) calculations. The differences observed between Molecular Beam Epitaxy (MBE) and Metal Organic Vapor Phase Epitaxy (MOVPE) growth of InAs nanowires can be explained by these different surfaces terminations. The transition between a vapor solid (VS) and a vapor liquid solid (VLS) growth mechanism is presented. Optimized growth conditions lead to very high aspect ratio nanowires (up to 50 nm in diameter and 3 micron in length) without passing the 410 °C thermal limit, which makes the whole process CMOS compatible. Overall, our results suggest a new method for surface preparation and a possible tuning of the growth mechanism using different surface terminations. |
Author | Dhungana, Daya S. Sartori, Nicolo Fazzini, Pier-Francesco Plissard, Sébastien R. Cristiano, Filadelfo Hemeryck, Anne |
Author_xml | – sequence: 1 givenname: Daya S. surname: Dhungana fullname: Dhungana, Daya S. organization: CNRS, LAAS-CNRS, Université de Toulouse – sequence: 2 givenname: Anne surname: Hemeryck fullname: Hemeryck, Anne organization: CNRS, LAAS-CNRS, Université de Toulouse – sequence: 3 givenname: Nicolo surname: Sartori fullname: Sartori, Nicolo organization: CNRS, LAAS-CNRS, Université de Toulouse – sequence: 4 givenname: Pier-Francesco surname: Fazzini fullname: Fazzini, Pier-Francesco organization: LPCNO, INSA, Université de Toulouse – sequence: 5 givenname: Filadelfo surname: Cristiano fullname: Cristiano, Filadelfo organization: CNRS, LAAS-CNRS, Université de Toulouse – sequence: 6 givenname: Sébastien R. surname: Plissard fullname: Plissard, Sébastien R. email: sebastien.plissard@laas.fr organization: CNRS, LAAS-CNRS, Université de Toulouse |
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CitedBy_id | crossref_primary_10_1016_j_vacuum_2024_113445 crossref_primary_10_1021_acs_jpcc_2c01060 crossref_primary_10_1088_1361_6528_ac8bdb crossref_primary_10_1109_JQE_2022_3151082 crossref_primary_10_1039_D2NA00546H crossref_primary_10_3389_fmats_2024_1375200 |
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Copyright | Tsinghua University Press and Springer-Verlag GmbH Germany, part of Springer Nature 2018 Nano Research is a copyright of Springer, (2018). All Rights Reserved. Tsinghua University Press and Springer-Verlag GmbH Germany, part of Springer Nature 2018. Distributed under a Creative Commons Attribution 4.0 International License |
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Keywords | III-V semiconductors on silicon density functional theory (DFT) modeling InAs nanowires self-catalyzed growth growth modeling hydrogen preparation |
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Snippet | A CMOS compatible process is presented in order to grow self-catalyzed InAs nanowires on silicon by molecular beam epitaxy. The crucial step of this process is... |
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SubjectTerms | Arsenic Atomic/Molecular Structure and Spectra Biomedicine Biotechnology Chemistry and Materials Science CMOS Compatibility Condensed Matter Condensed Matter Physics Degassing Density functional theory Epitaxial growth Epitaxy Growth conditions High aspect ratio Indium arsenides Materials Science Metalorganic chemical vapor deposition Molecular beam epitaxy Nanotechnology Nanowires Physics Research Article Substrates Surface preparation Vapor phase epitaxy Vapor phases Vapors |
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Title | Insight of surface treatments for CMOS compatibility of InAs nanowires |
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