Using temperature to tune film roughness: nonintuitive behavior in a simple system

• Published in: Physical review letters Vol. 85; no. 4; p. 800
• Main Authors: Stoldt, CR, Caspersen, KJ, Bartelt, MC, Jenks, CJ, Evans, JW, Thiel, PA
• Format: Journal Article
• Language: English
• Published: United States 24.07.2000

Ag(100) homoepitaxy constitutes one of the simplest systems in which to study thin-film growth. Yet we find that the roughness variation with temperature is extraordinarily complex. Specifically, as the deposition temperature is reduced from 300 to 50 K, the roughness of 25 monolayer films first inc...