APA (7th ed.) Citation

Borhade, P. S., Chen, T., Chen, D., Chen, Y., Yao, Y., Yen, Z., . . . Hofmann, M. (2024). Self‐Expansion Based Multi‐Patterning for 2D Materials Fabrication beyond the Lithographical Limit. Small (Weinheim an der Bergstrasse, Germany), 20(22), e2311209-n/a. https://doi.org/10.1002/smll.202311209

Chicago Style (17th ed.) Citation

Borhade, Poonam Subhash, Tawat Chen, Ding‐Rui Chen, Yu‐Xiang Chen, Yu‐Chi Yao, Zhi‐Long Yen, Chun Hsiung Tsai, Ya‐Ping Hsieh, and Mario Hofmann. "Self‐Expansion Based Multi‐Patterning for 2D Materials Fabrication Beyond the Lithographical Limit." Small (Weinheim an Der Bergstrasse, Germany) 20, no. 22 (2024): e2311209-n/a. https://doi.org/10.1002/smll.202311209.

MLA (9th ed.) Citation

Borhade, Poonam Subhash, et al. "Self‐Expansion Based Multi‐Patterning for 2D Materials Fabrication Beyond the Lithographical Limit." Small (Weinheim an Der Bergstrasse, Germany), vol. 20, no. 22, 2024, pp. e2311209-n/a, https://doi.org/10.1002/smll.202311209.