Third-order optical nonlinearity in silicon oxycarbide films

• Published in: Optical materials Vol. 104; p. 109945
• Main Authors: Yu, Xiuru, Yin, Luying, Lu, Heng, Huo, Yanyan, Jiang, Shouzhen, Zhao, Lina, Man, Baoyuan, Ning, Tingyin
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 01.06.2020
• Subjects: Nonlinear absorption; Nonlinear refraction; Silicon oxycarbide film; Z-scan; Silicon oxycarbide film; Nonlinear absorption; Z-scan; Nonlinear refraction

We study the third-order nonlinear optical properties of amorphous silicon oxycarbide (SiOxCy) films prepared by magnetron sputtering at room temperature and annealed in oxygen atmosphere at the temperature ranging from 200 °C to 600 °C. The third-order optical nonlinearity of the films was measured...