Study on the characteristics of atomic hydrogen cleaning carbon contamination on multilayers

• Published in: Vacuum Vol. 196; p. 110738
• Main Authors: Song, Yuan, Lu, Qipeng, Gong, Xuepeng, Wang, Dazhuang, Zhang, Zhen, Yu, Bo, Yao, Shun, Mao, Qijun, Ma, Tianyu, Bai, Yang
• Format: Journal Article
• Language: English
• Published: Elsevier Ltd 01.02.2022
• Subjects: Atomic hydrogen cleaning; Carbon contamination on multilayers; Cleaning mechanism; Extreme ultraviolet lithography; Synchrotron radiation; Extreme ultraviolet lithography; Carbon contamination on multilayers; Cleaning mechanism; Synchrotron radiation; Atomic hydrogen cleaning

Mo/Si multilayers are widely used in synchrotron radiation beam-lines and extreme ultraviolet lithography machines. With the increasing power of light source, the problem of carboncontamination on multilayers becomes more and more serious. In-situ efficient and non-damage removal of carbon contamina...