Fabrication of chemical patterns from graphoepitaxially assembled block copolymer films by molecular transfer printing

Fabrication of chemical patterns by electron beam lithography or extreme ultraviolet interference lithography is either low-throughput or prohibitively expensive to practice at sub-50 nm feature dimension. Here we report a new high-throughput approach that combines the advantages of both graphoepita...

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Published inPolymer (Guilford) Vol. 55; no. 15; pp. 3278 - 3283
Main Authors Jin, Xiaosa, Zhang, Xiaosa, Wan, Lei, Nealey, Paul F., Ji, Shengxiang
Format Journal Article
LanguageEnglish
Published Kidlington Elsevier Ltd 25.06.2014
Elsevier
Subjects
Applied sciences
Assembly
Block copolymers
Chemical pattern
Density
Electron beam lithography
Engine blocks
Exact sciences and technology
Graphoepitaxy
Lamellar structure
Machinery and processing
Miscellaneous
Molecular transfer printing
Plastics
Polymer industry, paints, wood
Strategy
Technology of polymers
Transfer printing
Molecular transfer printing
Graphoepitaxy
Chemical pattern
Ultrathin films
Patterning
Polymer blends
Silsesquioxane polymer
Coupled method
Ternary mixture
Methyl methacrylate polymer
Nanostructure
Experimental study
Methyl methacrylate copolymer
Domain structure
Transfer printing
Diblock copolymer
Styrene polymer
Styrene copolymer
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Abstract Fabrication of chemical patterns by electron beam lithography or extreme ultraviolet interference lithography is either low-throughput or prohibitively expensive to practice at sub-50 nm feature dimension. Here we report a new high-throughput approach that combines the advantages of both graphoepitaxy and molecular transfer printing (MTP) to fabricating chemical patterns at low cost for directed assembly of block copolymers. In this new approach, a cylinder-forming block copolymer ternary blend film is directed to assemble on a topographic HSQ substrate with sub-Lo, where Lo is the natural period of the block copolymer, relief structures to increase the feature density by a factor of ∼20, the surface domain pattern is replicated using MTP to create 1:1 chemical pattern, and then a lamellae-forming block copolymer is directed to assemble on the chemical pattern to realize high-aspect ratio Manhattan type nanostructures. This combined strategy allows us to fabricate chemical patterns with feature dimension below the resolution limit of current lithographic tools. [Display omitted]
AbstractList Fabrication of chemical patterns by electron beam lithography or extreme ultraviolet interference lithography is either low-throughput or prohibitively expensive to practice at sub-50 nm feature dimension. Here we report a new high-throughput approach that combines the advantages of both graphoepitaxy and molecular transfer printing (MTP) to fabricating chemical patterns at low cost for directed assembly of block copolymers. In this new approach, a cylinder-forming block copolymer ternary blend film is directed to assemble on a topographic HSQ substrate with sub-Lo, where Lo is the natural period of the block copolymer, relief structures to increase the feature density by a factor of ∼20, the surface domain pattern is replicated using MTP to create 1:1 chemical pattern, and then a lamellae-forming block copolymer is directed to assemble on the chemical pattern to realize high-aspect ratio Manhattan type nanostructures. This combined strategy allows us to fabricate chemical patterns with feature dimension below the resolution limit of current lithographic tools. [Display omitted]
Fabrication of chemical patterns by electron beam lithography or extreme ultraviolet interference lithography is either low-throughput or prohibitively expensive to practice at sub-50 nm feature dimension. Here we report a new high-throughput approach that combines the advantages of both graphoepitaxy and molecular transfer printing (MTP) to fabricating chemical patterns at low cost for directed assembly of block copolymers. In this new approach, a cylinder-forming block copolymer ternary blend film is directed to assemble on a topographic HSQ substrate with sub-L o, where L o is the natural period of the block copolymer, relief structures to increase the feature density by a factor of 20, the surface domain pattern is replicated using MTP to create 1:1 chemical pattern, and then a lamellae-forming block copolymer is directed to assemble on the chemical pattern to realize high-aspect ratio Manhattan type nanostructures. This combined strategy allows us to fabricate chemical patterns with feature dimension below the resolution limit of current lithographic tools.
Author Nealey, Paul F.
Zhang, Xiaosa
Ji, Shengxiang
Wan, Lei
Jin, Xiaosa
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CitedBy_id crossref_primary_10_1016_j_progpolymsci_2015_10_006
crossref_primary_10_1039_C7ME00101K
crossref_primary_10_1007_s10118_018_2056_4
crossref_primary_10_3390_polym16121740
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Issue 15
Keywords Molecular transfer printing
Graphoepitaxy
Chemical pattern
Ultrathin films
Patterning
Polymer blends
Silsesquioxane polymer
Coupled method
Ternary mixture
Methyl methacrylate polymer
Nanostructure
Experimental study
Methyl methacrylate copolymer
Domain structure
Transfer printing
Diblock copolymer
Styrene polymer
Styrene copolymer
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Snippet Fabrication of chemical patterns by electron beam lithography or extreme ultraviolet interference lithography is either low-throughput or prohibitively...
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SubjectTerms Applied sciences
Assembly
Block copolymers
Chemical pattern
Density
Electron beam lithography
Engine blocks
Exact sciences and technology
Graphoepitaxy
Lamellar structure
Machinery and processing
Miscellaneous
Molecular transfer printing
Plastics
Polymer industry, paints, wood
Strategy
Technology of polymers
Transfer printing
Title Fabrication of chemical patterns from graphoepitaxially assembled block copolymer films by molecular transfer printing
URI https://dx.doi.org/10.1016/j.polymer.2014.05.040
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