APA (7th ed.) Citation

Childres, I., Tian, J., Miotkowski, I., & Chen, Y. (2013). AFM and Raman studies of topological insulator materials subject to argon plasma etching. Philosophical magazine (Abingdon, England), 93(6), 681-689. https://doi.org/10.1080/14786435.2012.728009

Chicago Style (17th ed.) Citation

Childres, Isaac, Jifa Tian, Ireneusz Miotkowski, and Yong Chen. "AFM and Raman Studies of Topological Insulator Materials Subject to Argon Plasma Etching." Philosophical Magazine (Abingdon, England) 93, no. 6 (2013): 681-689. https://doi.org/10.1080/14786435.2012.728009.

MLA (9th ed.) Citation

Childres, Isaac, et al. "AFM and Raman Studies of Topological Insulator Materials Subject to Argon Plasma Etching." Philosophical Magazine (Abingdon, England), vol. 93, no. 6, 2013, pp. 681-689, https://doi.org/10.1080/14786435.2012.728009.