Grazing incidence X-ray diffraction analysis of alkali fluoride thin films for optical devices

• Published in: Thin solid films Vol. 333; no. 1; pp. 157 - 164
• Main Authors: Cremona, M., Mauricio, M.H.P., Fehlberg, L.V., Nunes, R.A., Scavarda do Carmo, L.C., de Avillez, R.R., Caride, A.O.
• Format: Journal Article
• Language: English
• Published: Lausanne Elsevier B.V 23.11.1998; Elsevier Science
• Subjects: Alkali halides; Condensed matter: structure, mechanical and thermal properties; Exact sciences and technology; Mechanical and acoustical properties; Optical device; Physical properties of thin films, nonelectronic; Physics; Residual stress; Structure and morphology; thickness; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thin film structure and morphology; X-ray diffraction; X-ray diffraction; Alkali halides; Optical device; Residual stress; Inorganic compounds; Grazing incidence; Polycrystals; Binary compounds; Lithium fluorides; Residual stresses; XRD; Experimental study; Lattice parameters; Optical waveguides; Thin films; Multilayers; Luminescent devices; Physical vapor deposition; Alkali metals Fluorides; Sodium fluorides

Alkali fluoride multilayered thin films are promising systems for different optical applications, including light generation and waveguide. Despite this, some of their physical properties are still not well known. The mechanical behaviour of these materials, when evaporated in the form of thin films...