Plasmonic properties of titanium nitride thin films prepared by ion beam assisted deposition

• Published in: Materials letters Vol. 185; pp. 295 - 298
• Main Authors: Zhang, Lin-Ao, Liu, Hao-Nan, Suo, Xiao-Xia, Tong, Shuo, Li, Ying-Lan, Jiang, Zhao-Tan, Wang, Zhi
• Format: Journal Article
• Language: English
• Published: Amsterdam Elsevier B.V 15.12.2016; Elsevier BV
• Subjects: Deposition; Ion beam assisted deposition; Ion beam modification; Materials science; Nitrogen; Optical materials and properties; Optical properties; Partial pressure; Plasmonics; Plasmons; Studies; Temperature; Thin films; Titanium nitride; Thin films; Titanium nitride; Optical materials and properties; Ion beam modification; Plasmonics

Titanium nitride (TiNx) is regarded as a kind of promising plasmonic material for its high performances. We studied the influence of nitrogen partial pressure pn and deposition temperature Td on the structural and plasmonic properties of the TiNx thin films prepared by ion beam assisted deposition (...