Effects of helium ion implantation on the structure of nanophase and coarse-grain titanium films

• Published in: Nanostructured materials Vol. 11; no. 7; pp. 867 - 872
• Main Authors: Gao, Zheng, Gao, Yuzun, Li, Yonghong, Zhang, Taisong, Li, Yi
• Format: Journal Article
• Language: English
• Published: Oxford Elsevier Science 01.10.1999; Elsevier
• Subjects: Applied sciences; Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Materials science; Metals. Metallurgy; Nanoscale materials and structures: fabrication and characterization; Physics; Radiation treatment (particle and electromagnetic); Radiation treatments; Treatment of materials and its effects on microstructure and properties; Helium additions; Ion implantation; Films; Transition elements; Coarse grain structure; Titanium; Nanostructures; Experimental study; Microstructure; TEM
• DOI: 10.1016/S0965-9773(99)00382-7
• ISSN: 0965-9773

Nanophase and coarse-grain titanium films were prepared on Mo substrates by Ion Beam Assisted Deposition. Ion implantation of helium was used to simulate the behavior of helium in titanium films. Helium ions (100 keV) were implanted into the titanium films with a dose of 5 × 10 17/cm 2. The retained helium in the titanium films after implantation was detected by Enhanced Proton Back Scattering (EPBS). The microstructure of titanium films and the distribution of helium bubbles were studied by Transmission Electron Microscopy (TEM). It was found that helium bubbles were formed in the coarse-grain titanium films with a size distribution of 1 to 10 nm and a numerical density of 5 to 25 × 10 22/m 3. No helium bubble was observed in the nanophase titanium films. A discussion is presented for helium bubble formation.