Correlation between thermal resistance, channel temperature, infrared thermal maps and failure mechanisms in low power MESFET devices

Channel temperature T ch of GaAs MESFETs, determined by means of electrical measurements ( ΔV gs), has been compared and correlated with thermal maps obtained by high resolution infrared microscopy. Results show that in low power devices with a small number of gates, the value of T ch derived from Δ...

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Published inMicroelectronics and reliability Vol. 29; no. 2; pp. 117 - 124
Main Authors Canali, C., Chiussi, F., Donzelli, G., Magistrali, F., Zanoni, E.
Format Journal Article
LanguageEnglish
Published Oxford Elsevier Ltd 1989
Elsevier
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Abstract Channel temperature T ch of GaAs MESFETs, determined by means of electrical measurements ( ΔV gs), has been compared and correlated with thermal maps obtained by high resolution infrared microscopy. Results show that in low power devices with a small number of gates, the value of T ch derived from ΔV gs measurements is close to the maximum values of temperature measured on the hottest junctions on the chip. Local thermal inhomogeneities, in particular those observed in devices characterized by high values of R th, can explain and confirm results of failure analyses of MESFETs submitted to accelerated life tests in operating conditions where degradation phenomena occur in localized areas of the device.
AbstractList Channel temperature T sub(ch) of GaAs MESFETs, determined by means of electrical measurements ( Delta V sub(gs)), has been compared and correlated with thermal maps obtained by high resolution infrared microscopy. Results show that in low power devices with a small number of gates, the value of T sub(ch) derived from Delta V sub(gs) measurements is close to the maximum values of temperature measured on the hottest junctions on the chip. Local thermal inhomogeneities, in particular those observed in devices characterized by high values of R sub(th), can explain and confirm results of failure analyses of MESFETs submitted to accelerated life tests in operating conditions where degradation phenomena occur in localized areas of the device.
Channel temperature T ch of GaAs MESFETs, determined by means of electrical measurements ( ΔV gs), has been compared and correlated with thermal maps obtained by high resolution infrared microscopy. Results show that in low power devices with a small number of gates, the value of T ch derived from ΔV gs measurements is close to the maximum values of temperature measured on the hottest junctions on the chip. Local thermal inhomogeneities, in particular those observed in devices characterized by high values of R th, can explain and confirm results of failure analyses of MESFETs submitted to accelerated life tests in operating conditions where degradation phenomena occur in localized areas of the device.
Author Donzelli, G.
Magistrali, F.
Chiussi, F.
Canali, C.
Zanoni, E.
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Cites_doi 10.1049/el:19870060
10.1109/EDL.1986.26338
10.1002/j.1538-7305.1979.tb02244.x
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Snippet Channel temperature T ch of GaAs MESFETs, determined by means of electrical measurements ( ΔV gs), has been compared and correlated with thermal maps obtained...
Channel temperature T sub(ch) of GaAs MESFETs, determined by means of electrical measurements ( Delta V sub(gs)), has been compared and correlated with thermal...
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SubjectTerms Applied sciences
Electronics
Exact sciences and technology
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Transistors
Title Correlation between thermal resistance, channel temperature, infrared thermal maps and failure mechanisms in low power MESFET devices
URI https://dx.doi.org/10.1016/0026-2714(89)90556-8
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