Dark current suppression of amorphous selenium based photosensors by the ZnO hole blocking layer

To study the influence of defects in the hole blocking layer (HBL) on the dark current of amorphous selenium (a-Se) based photosensors, we prepared ZnO thin films by reactive sputter deposition (RSD) for the use as the HBL of the photosensors. The ZnO HBL layers prepared with different oxygen flow r...

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Published inCurrent applied physics Vol. 14; no. 5; pp. 659 - 664
Main Authors Yu, Tung-Yuan, Pan, Fu-Ming, Chang, Cheng-Yi, Hu, Tien, Chen, Jenn-Fang, Wang, Jia-Feng, Lin, Cheng-Lu, Chen, Tsung-Han, Chen, Te-Ming
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.05.2014
한국물리학회
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Abstract To study the influence of defects in the hole blocking layer (HBL) on the dark current of amorphous selenium (a-Se) based photosensors, we prepared ZnO thin films by reactive sputter deposition (RSD) for the use as the HBL of the photosensors. The ZnO HBL layers prepared with different oxygen flow rates were characterized by X-ray photoelectron spectroscopy, Raman scattering analysis and photoluminescence, indicating that the density of oxygen vacancies in the ZnO thin films is significantly affected by the oxygen flow rate. The deep level transient spectroscopy measurement reveals two hole trap levels present in the RSD deposited ZnO thin films; one is at 0.94 eV and the other at 0.24 eV above the valence band edge. The electrical performance of the a-Se photosensor is largely influenced by the amount of oxygen vacancies in the ZnO thin film. The a-Se photosensor with the ZnO HBL of the most oxygen vacancies has the lowest dark current and demonstrates the highest breakdown field. •ZnO film was prepared for the use as the hole blocking layer in a-Se photosensors.•Material and electrical analyses related oxygen vacancies with hole traps in ZnO.•Dark current of a-Se photosensors depends on the oxygen vacancy density in ZnO.
AbstractList To study the influence of defects in the hole blocking layer (HBL) on the dark current of amorphous selenium (a-Se) based photosensors, we prepared ZnO thin films by reactive sputter deposition (RSD) for the use as the HBL of the photosensors. The ZnO HBL layers prepared with different oxygen flow rates were characterized by X-ray photoelectron spectroscopy, Raman scattering analysis and photoluminescence, indicating that the density of oxygen vacancies in the ZnO thin films is significantly affected by the oxygen flow rate. The deep level transient spectroscopy measurement reveals two hole trap levels present in the RSD deposited ZnO thin films; one is at 0.94 eV and the other at 0.24 eV above the valence band edge. The electrical performance of the a-Se photosensor is largely influenced by the amount of oxygen vacancies in the ZnO thin film. The a-Se photosensor with the ZnO HBL of the most oxygen vacancies has the lowest dark current and demonstrates the highest breakdown field. •ZnO film was prepared for the use as the hole blocking layer in a-Se photosensors.•Material and electrical analyses related oxygen vacancies with hole traps in ZnO.•Dark current of a-Se photosensors depends on the oxygen vacancy density in ZnO.
To study the influence of defects in the hole blocking layer (HBL) on the dark current of amorphous selenium (a-Se) based photosensors, we prepared ZnO thin films by reactive sputter deposition (RSD) for the use as the HBL of the photosensors. The ZnO HBL layers prepared with different oxygen flow rates were characterized by X-ray photoelectron spectroscopy, Raman scattering analysis and photoluminescence, indicating that the density of oxygen vacancies in the ZnO thin films is significantly affected by the oxygen flow rate. The deep level transient spectroscopy measurement reveals two hole trap levels present in the RSD deposited ZnO thin films; one is at 0.94 eV and the other at 0.24 eV above the valence band edge. The electrical performance of the a-Se photosensor is largely influenced by the amount of oxygen vacancies in the ZnO thin film. The a-Se photosensor with the ZnO HBL of the most oxygen vacancies has the lowest dark current and demonstrates the highest breakdown field. KCI Citation Count: 7
To study the influence of defects in the hole blocking layer (HBL) on the dark current of amorphous selenium (a-Se) based photosensors, we prepared ZnO thin films by reactive sputter deposition (RSD) for the use as the HBL of the photosensors. The ZnO HBL layers prepared with different oxygen flow rates were characterized by X-ray photoelectron spectroscopy, Raman scattering analysis and photoluminescence, indicating that the density of oxygen vacancies in the ZnO thin films is significantly affected by the oxygen flow rate. The deep level transient spectroscopy measurement reveals two hole trap levels present in the RSD deposited ZnO thin films; one is at 0.94 eV and the other at 0.24 eV above the valence band edge. The electrical performance of the a-Se photosensor is largely influenced by the amount of oxygen vacancies in the ZnO thin film. The a-Se photosensor with the ZnO HBL of the most oxygen vacancies has the lowest dark current and demonstrates the highest breakdown field.
Author Lin, Cheng-Lu
Yu, Tung-Yuan
Chen, Tsung-Han
Hu, Tien
Chen, Jenn-Fang
Chen, Te-Ming
Wang, Jia-Feng
Chang, Cheng-Yi
Pan, Fu-Ming
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Oxygen vacancy
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Snippet To study the influence of defects in the hole blocking layer (HBL) on the dark current of amorphous selenium (a-Se) based photosensors, we prepared ZnO thin...
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SubjectTerms Amorphous Se
Dark current
Density
Deposition
DLTS
Flow rate
Hole blocking layer
Oxygen vacancy
Selenium
Thin films
Vacancies
Zinc oxide
물리학
Title Dark current suppression of amorphous selenium based photosensors by the ZnO hole blocking layer
URI https://dx.doi.org/10.1016/j.cap.2014.02.011
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