Multipacting mitigation by atomic layer deposition: The case study of titanium nitride - Kalboussi, Y.; Dadouch, S.; Delatte, B.; Miserque, F.; Dragoe, D.; Eozenou, F.; Baudrier, M.; Tusseau-Nenez, S.; Zheng, Y.; Maurice, L.; Cenni, E.; Bertrand, Q.; et al. (Journal of applied physics, 2024)
Keywords: Atomic layer epitaxy; Complex shape objects; Electrical resistivity; Electron emission; Engineering Sciences; Film thickness; Particle accelerators; Physics; Titanium nitride; Particle accelerators; Electron yield; Atomic layer deposition; Crystallographic defects; Total electron emission yield TEEY; Superconductivity