Multipacting mitigation by atomic layer deposition: The case study of titanium nitride

This study investigates the use of atomic layer deposition (ALD) to mitigate multipacting phenomena inside superconducting radio frequency cavities used in particle accelerators while preserving high quality factors in the 1010 range. The unique ALD capability to control the film thickness down to t...

Full description

Saved in:
Bibliographic Details
Published inJournal of applied physics Vol. 136; no. 8
Main Authors Kalboussi, Y., Dadouch, S., Delatte, B., Miserque, F., Dragoe, D., Eozenou, F., Baudrier, M., Tusseau-Nenez, S., Zheng, Y., Maurice, L., Cenni, E., Bertrand, Q., Sahuquet, P., Fayette, E., Jullien, G., Inguimbert, C., Belhaj, M., Proslier, T.
Format Journal Article
LanguageEnglish
Published Melville American Institute of Physics 28.08.2024
Subjects
Atomic layer epitaxy
Complex shape objects
Electrical resistivity
Electron emission
Engineering Sciences
Film thickness
Particle accelerators
Physics
Titanium nitride
Particle accelerators
Electron yield
Atomic layer deposition
Crystallographic defects
Total electron emission yield TEEY
Superconductivity
Online AccessGet full text

Cover

Abstract This study investigates the use of atomic layer deposition (ALD) to mitigate multipacting phenomena inside superconducting radio frequency cavities used in particle accelerators while preserving high quality factors in the 1010 range. The unique ALD capability to control the film thickness down to the atomic level on arbitrary complex shape objects enables the fine-tuning of TiN film resistivity and total electron emission yield (TEEY) from coupons to devices. This level of control allows us to adequately choose a TiN film thickness that provides both high resistivity to prevent Ohmic losses and a low TEEY to mitigate multipacting for the application of interest. The methodology presented in this work can be scaled to other domains and devices subject to RF fields in vacuum and sensitive to multipacting or electron discharge processes with their own requirements in resistivities and TEEY values.
AbstractList This study investigates the use of atomic layer deposition (ALD) to mitigate multipacting phenomena inside superconducting radio frequency cavities used in particle accelerators while preserving high quality factors in the 1010 range. The unique ALD capability to control the film thickness down to the atomic level on arbitrary complex shape objects enables the fine-tuning of TiN film resistivity and total electron emission yield (TEEY) from coupons to devices. This level of control allows us to adequately choose a TiN film thickness that provides both high resistivity to prevent Ohmic losses and a low TEEY to mitigate multipacting for the application of interest. The methodology presented in this work can be scaled to other domains and devices subject to RF fields in vacuum and sensitive to multipacting or electron discharge processes with their own requirements in resistivities and TEEY values.
Author Kalboussi, Y.
Dadouch, S.
Tusseau-Nenez, S.
Zheng, Y.
Sahuquet, P.
Proslier, T.
Baudrier, M.
Inguimbert, C.
Fayette, E.
Bertrand, Q.
Miserque, F.
Dragoe, D.
Jullien, G.
Eozenou, F.
Cenni, E.
Belhaj, M.
Maurice, L.
Delatte, B.
Author_xml – sequence: 1
  givenname: Y.
  surname: Kalboussi
  fullname: Kalboussi, Y.
  organization: Département des Accélérateurs, de la Cryogénie et du Magnétisme, Université Paris-Saclay, CEA
– sequence: 2
  givenname: S.
  surname: Dadouch
  fullname: Dadouch, S.
  organization: Département Physique, Instrumentation, Environnement, Espace, ONERA
– sequence: 3
  givenname: B.
  surname: Delatte
  fullname: Delatte, B.
  organization: Département des Accélérateurs, de la Cryogénie et du Magnétisme, Université Paris-Saclay, CEA
– sequence: 4
  givenname: F.
  surname: Miserque
  fullname: Miserque, F.
  organization: Service de Recherche sur la Corrosion et le Comportement des Matériaux, Université Paris-Saclay
– sequence: 5
  givenname: D.
  surname: Dragoe
  fullname: Dragoe, D.
  organization: , Université Paris-Saclay
– sequence: 6
  givenname: F.
  surname: Eozenou
  fullname: Eozenou, F.
  organization: Département des Accélérateurs, de la Cryogénie et du Magnétisme, Université Paris-Saclay, CEA
– sequence: 7
  givenname: M.
  surname: Baudrier
  fullname: Baudrier, M.
  organization: Département des Accélérateurs, de la Cryogénie et du Magnétisme, Université Paris-Saclay, CEA
– sequence: 8
  givenname: S.
  surname: Tusseau-Nenez
  fullname: Tusseau-Nenez, S.
  organization: Laboratoire de Physique de la Matière Condensée, CNRS-Ecole polytechnique
– sequence: 9
  givenname: Y.
  surname: Zheng
  fullname: Zheng, Y.
  organization: Institut des NanoSciences de Paris, CNRS-Sorbonne Université
– sequence: 10
  givenname: L.
  surname: Maurice
  fullname: Maurice, L.
  organization: Département des Accélérateurs, de la Cryogénie et du Magnétisme, Université Paris-Saclay, CEA
– sequence: 11
  givenname: E.
  surname: Cenni
  fullname: Cenni, E.
  organization: Département des Accélérateurs, de la Cryogénie et du Magnétisme, Université Paris-Saclay, CEA
– sequence: 12
  givenname: Q.
  surname: Bertrand
  fullname: Bertrand, Q.
  organization: Département des Accélérateurs, de la Cryogénie et du Magnétisme, Université Paris-Saclay, CEA
– sequence: 13
  givenname: P.
  surname: Sahuquet
  fullname: Sahuquet, P.
  organization: Département des Accélérateurs, de la Cryogénie et du Magnétisme, Université Paris-Saclay, CEA
– sequence: 14
  givenname: E.
  surname: Fayette
  fullname: Fayette, E.
  organization: Département des Accélérateurs, de la Cryogénie et du Magnétisme, Université Paris-Saclay, CEA
– sequence: 15
  givenname: G.
  surname: Jullien
  fullname: Jullien, G.
  organization: Département des Accélérateurs, de la Cryogénie et du Magnétisme, Université Paris-Saclay, CEA
– sequence: 16
  givenname: C.
  surname: Inguimbert
  fullname: Inguimbert, C.
  organization: Département Physique, Instrumentation, Environnement, Espace, ONERA
– sequence: 17
  givenname: M.
  surname: Belhaj
  fullname: Belhaj, M.
  organization: Département Physique, Instrumentation, Environnement, Espace, ONERA
– sequence: 18
  givenname: T.
  surname: Proslier
  fullname: Proslier, T.
  organization: Département des Accélérateurs, de la Cryogénie et du Magnétisme, Université Paris-Saclay, CEA
BackLink https://hal.science/hal-04879943$$DView record in HAL
BookMark eNp9kEtPwzAQhC1UJMrjwD-wxAmktLtxHg63quIlFXEBrpbjOK2rNC62g9R_T6IWuCBOK-1-O5qZUzJqbasJuUSYIGRsmk4gjrFI2BEZI_AiytMURmQMEGPEi7w4IaferwEQOSvG5P25a4LZShVMu6QbE8xSBmNbWu6oDHZjFG3kTjta6a31Zjjd0teVpkp6TX3oqh21NQ0myNZ0G9qa4Eylz8lxLRuvLw7zjLzd373OH6PFy8PTfLaIFMswRApBy4zpJIFY5wwRoGZVptK0LBSvFM-rNMMyViXnTJZQy0yyOqlVhXmNDNkZud7rrmQjts5spNsJK414nC3EsIOE50Vfx-fAXu3ZrbMfnfZBrG3n2t6eYFDw3hDGcU9N95Ry1nuna6H6bEPu4KRpBIIYihapOBT96-Hn49vIX-zNnvXfqv_AXxqai9g
CODEN JAPIAU
CitedBy_id crossref_primary_10_1016_j_jelechem_2025_119005
crossref_primary_10_1063_5_0256365
crossref_primary_10_1088_1402_4896_adbea7
crossref_primary_10_3390_coatings15010055
Cites_doi 10.1088/0741-3335/54/8/085007
10.1021/cm0304546
10.1038/s41598-019-57160-w
10.1016/j.mattod.2014.04.026
10.1016/j.jmrt.2019.04.018
10.1088/0268-1242/27/7/074013
10.1016/0040-6090(88)90375-6
10.1016/j.phpro.2012.03.718
10.1016/j.apsusc.2015.10.121
10.1063/1.4984761
10.1088/0268-1242/27/7/074002
10.1126/science.1144787
10.1016/j.apsadv.2021.100112
10.1116/1.579890
10.1016/j.nimb.2022.05.006
10.1103/PhysRevB.96.184515
10.1063/1.1490410
10.1016/0368-2048(95)02507-3
10.1063/1.5113671
10.1016/j.nima.2017.06.003
10.1063/1.4905280
10.1103/PhysRevB.1.1382
10.1002/adma.201200397
10.1002/anie.200301652
10.1116/11.20121107
10.1080/00018735200101151
10.1063/1.338159
10.1016/j.nimb.2020.11.016
10.1063/5.0202214
10.1088/1361-6668/aa6376
10.1103/PhysRevResearch.2.032030
10.1007/s11214-018-0549-7
10.1021/cr900056b
ContentType Journal Article
Copyright Author(s)
2024 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 4.0 International (CC BY-NC-ND) license (https://creativecommons.org/licenses/by-nc-nd/4.0/).
Attribution - NonCommercial - NoDerivatives
Copyright_xml – notice: Author(s)
– notice: 2024 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 4.0 International (CC BY-NC-ND) license (https://creativecommons.org/licenses/by-nc-nd/4.0/).
– notice: Attribution - NonCommercial - NoDerivatives
DBID AJDQP
AAYXX
CITATION
8FD
H8D
L7M
1XC
VOOES
DOI 10.1063/5.0221943
DatabaseName AIP Open Access Journals
CrossRef
Technology Research Database
Aerospace Database
Advanced Technologies Database with Aerospace
Hyper Article en Ligne (HAL)
Hyper Article en Ligne (HAL) (Open Access)
DatabaseTitle CrossRef
Technology Research Database
Aerospace Database
Advanced Technologies Database with Aerospace
DatabaseTitleList CrossRef

Technology Research Database
Database_xml – sequence: 1
  dbid: AJDQP
  name: AIP Open Access Journals
  url: https://publishing.aip.org/librarians/open-access-policy
  sourceTypes: Publisher
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
Physics
EISSN 1089-7550
ExternalDocumentID oai_HAL_hal_04879943v1
10_1063_5_0221943
jap
GrantInformation_xml – fundername: Horizon 2020 Framework Programme
  grantid: 730871
  funderid: 10.13039/100010661
– fundername: Commissariat à l'Énergie Atomique et aux Énergies Alternatives
  grantid: PTC-MP
  funderid: 10.13039/501100006489
– fundername: Region ile de France, projet Sesame
  grantid: AXESRF
– fundername: Horizon 2020 Framework Programme
  grantid: 101004730
  funderid: 10.13039/100010661
GroupedDBID -DZ
-~X
.DC
2-P
29J
4.4
53G
5GY
5VS
85S
AAAAW
AABDS
AAEUA
AAIKC
AAMNW
AAPUP
AAYIH
ABFTF
ABJNI
ABZEH
ACBEA
ACBRY
ACGFO
ACGFS
ACLYJ
ACNCT
ACZLF
ADCTM
AEGXH
AEJMO
AENEX
AFATG
AFHCQ
AGKCL
AGLKD
AGMXG
AGTJO
AHSDT
AIAGR
AIDUJ
AJDQP
AJJCW
AJQPL
ALEPV
ALMA_UNASSIGNED_HOLDINGS
AQWKA
ATXIE
AWQPM
BDMKI
BPZLN
CS3
D0L
DU5
EBS
ESX
F5P
FDOHQ
FFFMQ
HAM
M6X
M71
M73
N9A
NPSNA
O-B
P2P
RIP
RNS
RQS
RXW
SC5
TAE
TN5
TWZ
UCJ
UHB
UPT
WH7
XSW
YQT
YZZ
ZCA
~02
AAGWI
AAYXX
ABJGX
ADMLS
CITATION
8FD
H8D
L7M
1XC
VOOES
ID FETCH-LOGICAL-c361t-c10ea63e4402e731100f3d6c55b9c8dc87d561b2cb883ab0fa6a3f4fcd17f1313
IEDL.DBID AJDQP
ISSN 0021-8979
IngestDate Sat Aug 30 06:24:09 EDT 2025
Mon Jun 30 16:39:44 EDT 2025
Sun Jul 06 05:05:49 EDT 2025
Thu Apr 24 23:07:11 EDT 2025
Fri Aug 30 04:07:42 EDT 2024
IsDoiOpenAccess true
IsOpenAccess true
IsPeerReviewed true
IsScholarly true
Issue 8
Keywords Particle accelerators
Electron yield
Atomic layer deposition
Crystallographic defects
Total electron emission yield TEEY
Superconductivity
Language English
License All article content, except where otherwise noted, is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 4.0 International (CC BY-NC-ND) license (https://creativecommons.org/licenses/by-nc-nd/4.0/).
Attribution - NonCommercial - NoDerivatives: http://creativecommons.org/licenses/by-nc-nd
LinkModel DirectLink
MergedId FETCHMERGED-LOGICAL-c361t-c10ea63e4402e731100f3d6c55b9c8dc87d561b2cb883ab0fa6a3f4fcd17f1313
Notes ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 14
ORCID 0000-0001-6941-9932
0000-0002-8536-1205
0000-0001-8459-1909
0000-0002-6273-6772
0000-0002-1430-0034
0009-0009-0911-2926
0009-0004-9397-4425
OpenAccessLink http://dx.doi.org/10.1063/5.0221943
PQID 3098361122
PQPubID 2050677
PageCount 12
ParticipantIDs scitation_primary_10_1063_5_0221943
hal_primary_oai_HAL_hal_04879943v1
crossref_citationtrail_10_1063_5_0221943
crossref_primary_10_1063_5_0221943
proquest_journals_3098361122
PublicationCentury 2000
PublicationDate 2024-08-28
PublicationDateYYYYMMDD 2024-08-28
PublicationDate_xml – month: 08
  year: 2024
  text: 2024-08-28
  day: 28
PublicationDecade 2020
PublicationPlace Melville
PublicationPlace_xml – name: Melville
PublicationTitle Journal of applied physics
PublicationYear 2024
Publisher American Institute of Physics
Publisher_xml – name: American Institute of Physics
References Van Delft, Garcia-Alonso, Kessels (c19) 2012
Meng, Yang, Sun (c20) 2012
Garwin, King, Kirby, Aita (c11) 1987
Park, Pedraza, Allen (c37) 1996
Padamsee (c42) 2017
Bajek, Wackerow, Zanin, Baudin, Bogdanowicz, Valdivieso, Calatroni, Di Girolamo, Sitko, Himmerlich, Taborelli, Chiggiato, Abdolvand (c15) 2020
Halbach, Holsinger (c43) 1976
Gurevich, Kubo (c46) 2017
Sondheimer (c38) 1952
Jokela, Veryovkin, Zinovev, Elam, Mane, Peng, Insepov (c22) 2012
Groner, Fabreguette, Elam, George (c24) 2004
Johnson, Hultqvist, Bent (c16) 2014
Guo, Wang, Xu, Zhu, Wen, Miao, Cao, Si, Lu, Guo (c35) 2019
Wiemer, Lamagna, Fanciulli (c18) 2012
Johari, Rosli, Juoi, Yazid (c33) 2019
Pierron, Inguimbert, Belhaj, Gineste, Puech, Raine (c29) 2017
Elam, Groner, George (c23) 2002
Leskelä, Ritala (c17) 2003
Fairley, Fernandez, Richard-Plouet, Guillot-Deudon, Walton, Smith, Flahaut, Greiner, Biesinger, Tougaard, Morgan, Baltrusaitis (c27) 2021
Gibaru, Inguimbert, Caron, Raine, Lambert, Puech (c30) 2021
Jaeger, Patscheider (c28) 2013
Hiltunen, Leskelä, Mäkelä, Niinistö, Nykänen, Soininen (c25) 1988
Prakash, Jana, Kumar (c5) 2017
George (c21) 2010
Gunn (c1) 2012
Mayadas, Shatzkes (c39) 1970
Zemek, Hucek, Jablonski, Tilinin (c34) 1995
Angelucci, Novelli, Spallino, Liedl, Larciprete, Cimino (c13) 2020
Inguimbert, Gibaru, Caron, Angelucci, Spallino, Cimino (c31) 2022
Streltsov, Berthelier, Chernyshov, Frolov, Honary, Kosch, McCoy, Mishin, Rietveld (c2) 2018
Dulub, Batzilln, Solovev, Loginova, Alchagirov, Madey, Diebold (c36) 2007
Chang, Liu, Verboncoeur, Chen, Guo, Li, Wu (c14) 2015
Gineste, Belhaj, Teyssedre, Puech (c26) 2015
Satta, Beyer, Maex, Elers, Haukka, Vantomme (c32) 2000
Kalboussi, Delatte, Bira, Dembele, Li, Miserque, Brun, Walls, Maurice, Dragoe, Leroy, Longuevergne, Gentils, Jublot-Leclerc, Jullien, Eozenou, Baudrier, Maurice, Proslier (c40) 2024
(2024082909431855200_c20) 2012; 24
(2024082909431855200_c15) 2020; 10
(2024082909431855200_c6) 1997
(2024082909431855200_c11) 1987; 61
(2024082909431855200_c27) 2021; 5
(2024082909431855200_c41) 2003
(2024082909431855200_c18) 2012; 27
(2024082909431855200_c31) 2022; 526
(2024082909431855200_c1) 2012; 54
(2024082909431855200_c16) 2014; 17
(2024082909431855200_c39) 1970; 1
(2024082909431855200_c35) 2019; 9
(2024082909431855200_c8) 2003
(2024082909431855200_c23) 2002; 73
(2024082909431855200_c24) 2004; 16
(2024082909431855200_c9) 2015
(2024082909431855200_c10) 2008
(2024082909431855200_c42) 2017; 30
2024082909431855200_c4
(2024082909431855200_c5) 2017; 867
(2024082909431855200_c19) 2012; 27
(2024082909431855200_c29) 2017; 121
(2024082909431855200_c38) 1952; 50
(2024082909431855200_c13) 2020; 2
(2024082909431855200_c2) 2018; 214
(2024082909431855200_c17) 2003; 42
(2024082909431855200_c26) 2015; 359
(2024082909431855200_c14) 2015; 106
(2024082909431855200_c43) 1976; 7
2024082909431855200_c44
(2024082909431855200_c34) 1995; 76
2024082909431855200_c45
(2024082909431855200_c36) 2007; 317
(2024082909431855200_c37) 1996; 14
(2024082909431855200_c7) 1979
(2024082909431855200_c21) 2010; 110
(2024082909431855200_c28) 2013; 20
(2024082909431855200_c12) 2004
(2024082909431855200_c33) 2019; 8
(2024082909431855200_c3) 2001
(2024082909431855200_c32) 2000; D6.5
(2024082909431855200_c22) 2012; 37
(2024082909431855200_c30) 2021; 487
(2024082909431855200_c46) 2017; 96
(2024082909431855200_c25) 1988; 166
(2024082909431855200_c40) 2024; 124
References_xml – start-page: 134001
  year: 2024
  ident: c40
  article-title: Reducing two-level system dissipations in 3D superconducting niobium resonators by atomic layer deposition and high temperature heat treatment
  publication-title: Appl. Phys. Lett.
– start-page: 032030
  year: 2020
  ident: c13
  article-title: Minimum thickness of carbon coating for multipacting suppression
  publication-title: Phys. Rev. Res.
– start-page: 074013
  year: 2012
  ident: c18
  article-title: Atomic layer deposition of rare-earth-based binary and ternary oxides for microelectronic applications
  publication-title: Semicond. Sci. Technol.
– start-page: 250
  year: 2020
  ident: c15
  article-title: Role of surface microgeometries on electron escape probability and secondary electron yield of metal surfaces
  publication-title: Sci. Rep.
– start-page: 095303
  year: 2019
  ident: c35
  article-title: Secondary electron emission characteristics of Al O coatings prepared by atomic layer deposition
  publication-title: AIP Adv.
– start-page: 3589
  year: 2012
  ident: c20
  article-title: Emerging applications of atomic layer deposition for lithium-ion battery studies
  publication-title: Adv. Mater.
– start-page: 2981
  year: 2002
  ident: c23
  article-title: Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition
  publication-title: Rev. Sci. Instrum.
– start-page: 111
  year: 2010
  ident: c21
  article-title: Atomic layer deposition: An overview
  publication-title: Chem. Rev.
– start-page: 1
  year: 2013
  ident: c28
  article-title: Single crystalline oxygen-free titanium nitride by XPS
  publication-title: Surf. Sci. Spectra
– start-page: 118
  year: 2018
  ident: c2
  article-title: Past, present and future of active radio frequency experiments in space
  publication-title: Space Sci. Rev.
– start-page: 740
  year: 2012
  ident: c22
  article-title: Secondary electron yield of emissive materials for large-area micro-channel plate detectors: Surface composition and film thickness dependencies
  publication-title: Phys. Procedia
– start-page: 639
  year: 2004
  ident: c24
  article-title: Low-temperature Al O atomic layer deposition
  publication-title: Chem. Mater.
– start-page: 215107
  year: 2017
  ident: c29
  article-title: Electron emission yield for low energy electrons: Monte Carlo simulation and experimental comparison for Al, Ag, and Si
  publication-title: J. Appl. Phys.
– start-page: 66
  year: 2021
  ident: c30
  article-title: Geant4 physics processes for microdosimetry and secondary electron emission simulation: Extension of MicroElec to very low energies and 11 materials (C, Al, Si, Ti, Ni, Cu, Ge, Ag, W, Kapton and SiO )
  publication-title: Nucl. Instrum. Method B
– start-page: 1382
  year: 1970
  ident: c39
  article-title: Electrical-resistivity model for polycrystalline films: The case of arbitrary reflection at external surfaces
  publication-title: Phys. Rev. B
– start-page: 100112
  year: 2021
  ident: c27
  article-title: Systematic and collaborative approach to problem solving using X-ray photoelectron spectroscopy
  publication-title: Appl. Surf. Sci. Adv.
– start-page: 1
  year: 2022
  ident: c31
  article-title: Modelling the impact on the secondary electron yield of carbon layers of various thicknesses on copper substrate
  publication-title: Nucl. Instrum. Method B
– start-page: 236
  year: 2014
  ident: c16
  article-title: A brief review of atomic layer deposition: From fundamentals to applications
  publication-title: Mater. Today
– start-page: 1052
  year: 2007
  ident: c36
  article-title: Electron-induced oxygen desorptionfrom the TiO (011)−2 × 1 surface leads to self-organized vacancies
  publication-title: Science
– start-page: 5548
  year: 2003
  ident: c17
  article-title: Atomic layer deposition chemistry: Recent developments and future challenges
  publication-title: Angew. Chem. Int. Ed.
– start-page: 128
  year: 2017
  ident: c5
  article-title: Multipacting studies in elliptic SRF cavities
  publication-title: Nucl. Instrum. Methods Phys. Res. Sect. A
– start-page: 1145
  year: 1987
  ident: c11
  article-title: Surface properties of metal nitrides and metal carbide films deposited on Nb for radio-frequency superconductivity
  publication-title: J. Appl. Phys.
– start-page: 612
  year: 2000
  ident: c32
  publication-title: Mater. Res. Soc. Symp. Proc.
– start-page: 213
  year: 1976
  ident: c43
  publication-title: Part. Accel.
– start-page: 149
  year: 1988
  ident: c25
  publication-title: Thin Solid Films
– start-page: 286
  year: 1996
  ident: c37
  article-title: Irradiation-induced decomposition of Al O during Auger electron spectroscopy analysis
  publication-title: J. Vac. Sci. Technol. A
– start-page: 398
  year: 2015
  ident: c26
  article-title: Investigation of the electron emission properties of silver: From exposed to ambient atmosphere Ag surface to ion-cleaned Ag surface
  publication-title: Appl. Surf. Sci.
– start-page: 2350
  year: 2019
  ident: c33
  article-title: Comparison on the TiO crystalline phases deposited via dip and spin coating using green sol–gel route
  publication-title: J. Mater. Res. Technol.
– start-page: 014102
  year: 2015
  ident: c14
  article-title: The effect of periodical wavy profile on suppressing windows multipactors under arbitrary electromagnetic mode
  publication-title: Appl. Phys. Lett.
– start-page: 443
  year: 1995
  ident: c34
  article-title: Photoelectron escape depth
  publication-title: J. Electron Spectrosc. Relat. Phenom.
– start-page: 053003
  year: 2017
  ident: c42
  article-title: 50 years of success for SRF accelerators—A review
  publication-title: Supercond. Sci. Technol.
– start-page: 499
  year: 1952
  ident: c38
  article-title: The mean free path of electrons in metals
  publication-title: Adv. Phys.
– start-page: 184515
  year: 2017
  ident: c46
  article-title: Surface impedance and optimum surface resistance of a superconductor with an imperfect surface
  publication-title: Phys. Rev. B
– start-page: 085007
  year: 2012
  ident: c1
  article-title: Evidence for strong secondary electron emission in the tokamak scrape-off layer
  publication-title: Plasma Phys. Controlled Fusion
– start-page: 074002
  year: 2012
  ident: c19
  article-title: Atomic layer deposition for photovoltaics: Applications and prospects for solar cell manufacturing
  publication-title: Semicond. Sci. Technol.
– volume: 54
  start-page: 085007
  year: 2012
  ident: 2024082909431855200_c1
  article-title: Evidence for strong secondary electron emission in the tokamak scrape-off layer
  publication-title: Plasma Phys. Controlled Fusion
  doi: 10.1088/0741-3335/54/8/085007
– volume: 16
  start-page: 639
  year: 2004
  ident: 2024082909431855200_c24
  article-title: Low-temperature Al2O3 atomic layer deposition
  publication-title: Chem. Mater.
  doi: 10.1021/cm0304546
– start-page: 1151
  year: 2003
  ident: 2024082909431855200_c41
  article-title: Study of ultra-clean surface for niobium SC cavities
– year: 1997
  ident: 2024082909431855200_c6
  article-title: Multipacting in 1.5-GHz superconducting niobium cavities of the CEBAF shape
– volume: 10
  start-page: 250
  year: 2020
  ident: 2024082909431855200_c15
  article-title: Role of surface microgeometries on electron escape probability and secondary electron yield of metal surfaces
  publication-title: Sci. Rep.
  doi: 10.1038/s41598-019-57160-w
– volume: 17
  start-page: 236
  year: 2014
  ident: 2024082909431855200_c16
  article-title: A brief review of atomic layer deposition: From fundamentals to applications
  publication-title: Mater. Today
  doi: 10.1016/j.mattod.2014.04.026
– volume: 8
  start-page: 2350
  year: 2019
  ident: 2024082909431855200_c33
  article-title: Comparison on the TiO2 crystalline phases deposited via dip and spin coating using green sol–gel route
  publication-title: J. Mater. Res. Technol.
  doi: 10.1016/j.jmrt.2019.04.018
– volume: 27
  start-page: 074013
  year: 2012
  ident: 2024082909431855200_c18
  article-title: Atomic layer deposition of rare-earth-based binary and ternary oxides for microelectronic applications
  publication-title: Semicond. Sci. Technol.
  doi: 10.1088/0268-1242/27/7/074013
– volume: 166
  start-page: 149
  year: 1988
  ident: 2024082909431855200_c25
  publication-title: Thin Solid Films
  doi: 10.1016/0040-6090(88)90375-6
– start-page: 4
  volume-title: ,”
  ident: 2024082909431855200_c44
  article-title: Studies of electron activities in SNS-type superconducting RF cavities
– volume: 37
  start-page: 740
  year: 2012
  ident: 2024082909431855200_c22
  article-title: Secondary electron yield of emissive materials for large-area micro-channel plate detectors: Surface composition and film thickness dependencies
  publication-title: Phys. Procedia
  doi: 10.1016/j.phpro.2012.03.718
– volume: 359
  start-page: 398
  year: 2015
  ident: 2024082909431855200_c26
  article-title: Investigation of the electron emission properties of silver: From exposed to ambient atmosphere Ag surface to ion-cleaned Ag surface
  publication-title: Appl. Surf. Sci.
  doi: 10.1016/j.apsusc.2015.10.121
– start-page: 264
  year: 2003
  ident: 2024082909431855200_c8
  article-title: Multipacting simulations for superconducting cavities and RF coupler waveguides
– volume: 121
  start-page: 215107
  year: 2017
  ident: 2024082909431855200_c29
  article-title: Electron emission yield for low energy electrons: Monte Carlo simulation and experimental comparison for Al, Ag, and Si
  publication-title: J. Appl. Phys.
  doi: 10.1063/1.4984761
– volume: 27
  start-page: 074002
  year: 2012
  ident: 2024082909431855200_c19
  article-title: Atomic layer deposition for photovoltaics: Applications and prospects for solar cell manufacturing
  publication-title: Semicond. Sci. Technol.
  doi: 10.1088/0268-1242/27/7/074002
– volume: 317
  start-page: 1052
  year: 2007
  ident: 2024082909431855200_c36
  article-title: Electron-induced oxygen desorptionfrom the TiO2(011)−2 × 1 surface leads to self-organized vacancies
  publication-title: Science
  doi: 10.1126/science.1144787
– volume: D6.5
  start-page: 612
  year: 2000
  ident: 2024082909431855200_c32
  publication-title: Mater. Res. Soc. Symp. Proc.
– ident: 2024082909431855200_c45
– volume-title: The RF and Microwave Handbook
  year: 2001
  ident: 2024082909431855200_c3
– volume: 5
  start-page: 100112
  year: 2021
  ident: 2024082909431855200_c27
  article-title: Systematic and collaborative approach to problem solving using X-ray photoelectron spectroscopy
  publication-title: Appl. Surf. Sci. Adv.
  doi: 10.1016/j.apsadv.2021.100112
– volume: 14
  start-page: 286
  year: 1996
  ident: 2024082909431855200_c37
  article-title: Irradiation-induced decomposition of Al2O3 during Auger electron spectroscopy analysis
  publication-title: J. Vac. Sci. Technol. A
  doi: 10.1116/1.579890
– start-page: 34
  year: 1979
  ident: 2024082909431855200_c7
  article-title: Multipacting in superconducting RF structures
– start-page: 3148
  year: 2015
  ident: 2024082909431855200_c9
  article-title: Titanium coating of ceramics for accelerator applications
– volume: 526
  start-page: 1
  year: 2022
  ident: 2024082909431855200_c31
  article-title: Modelling the impact on the secondary electron yield of carbon layers of various thicknesses on copper substrate
  publication-title: Nucl. Instrum. Method B
  doi: 10.1016/j.nimb.2022.05.006
– volume: 96
  start-page: 184515
  year: 2017
  ident: 2024082909431855200_c46
  article-title: Surface impedance and optimum surface resistance of a superconductor with an imperfect surface
  publication-title: Phys. Rev. B
  doi: 10.1103/PhysRevB.96.184515
– volume: 7
  start-page: 213
  issue: 4
  year: 1976
  ident: 2024082909431855200_c43
  publication-title: Part. Accel.
– volume: 73
  start-page: 2981
  year: 2002
  ident: 2024082909431855200_c23
  article-title: Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition
  publication-title: Rev. Sci. Instrum.
  doi: 10.1063/1.1490410
– ident: 2024082909431855200_c4
– volume: 76
  start-page: 443
  year: 1995
  ident: 2024082909431855200_c34
  article-title: Photoelectron escape depth
  publication-title: J. Electron Spectrosc. Relat. Phenom.
  doi: 10.1016/0368-2048(95)02507-3
– volume: 9
  start-page: 095303
  year: 2019
  ident: 2024082909431855200_c35
  article-title: Secondary electron emission characteristics of Al2O3 coatings prepared by atomic layer deposition
  publication-title: AIP Adv.
  doi: 10.1063/1.5113671
– volume: 867
  start-page: 128
  year: 2017
  ident: 2024082909431855200_c5
  article-title: Multipacting studies in elliptic SRF cavities
  publication-title: Nucl. Instrum. Methods Phys. Res. Sect. A
  doi: 10.1016/j.nima.2017.06.003
– volume: 106
  start-page: 014102
  year: 2015
  ident: 2024082909431855200_c14
  article-title: The effect of periodical wavy profile on suppressing windows multipactors under arbitrary electromagnetic mode
  publication-title: Appl. Phys. Lett.
  doi: 10.1063/1.4905280
– volume: 1
  start-page: 1382
  year: 1970
  ident: 2024082909431855200_c39
  article-title: Electrical-resistivity model for polycrystalline films: The case of arbitrary reflection at external surfaces
  publication-title: Phys. Rev. B
  doi: 10.1103/PhysRevB.1.1382
– volume: 24
  start-page: 3589
  year: 2012
  ident: 2024082909431855200_c20
  article-title: Emerging applications of atomic layer deposition for lithium-ion battery studies
  publication-title: Adv. Mater.
  doi: 10.1002/adma.201200397
– volume: 42
  start-page: 5548
  year: 2003
  ident: 2024082909431855200_c17
  article-title: Atomic layer deposition chemistry: Recent developments and future challenges
  publication-title: Angew. Chem. Int. Ed.
  doi: 10.1002/anie.200301652
– volume: 20
  start-page: 1
  year: 2013
  ident: 2024082909431855200_c28
  article-title: Single crystalline oxygen-free titanium nitride by XPS
  publication-title: Surf. Sci. Spectra
  doi: 10.1116/11.20121107
– volume: 50
  start-page: 499
  year: 1952
  ident: 2024082909431855200_c38
  article-title: The mean free path of electrons in metals
  publication-title: Adv. Phys.
  doi: 10.1080/00018735200101151
– start-page: 931
  year: 2008
  ident: 2024082909431855200_c10
  article-title: Titanium nitride coating of RF ceramic windows by reactive DC magnetron sputtering
– volume: 61
  start-page: 1145
  year: 1987
  ident: 2024082909431855200_c11
  article-title: Surface properties of metal nitrides and metal carbide films deposited on Nb for radio-frequency superconductivity
  publication-title: J. Appl. Phys.
  doi: 10.1063/1.338159
– volume: 487
  start-page: 66
  year: 2021
  ident: 2024082909431855200_c30
  article-title: Geant4 physics processes for microdosimetry and secondary electron emission simulation: Extension of MicroElec to very low energies and 11 materials (C, Al, Si, Ti, Ni, Cu, Ge, Ag, W, Kapton and SiO2)
  publication-title: Nucl. Instrum. Method B
  doi: 10.1016/j.nimb.2020.11.016
– volume: 124
  start-page: 134001
  year: 2024
  ident: 2024082909431855200_c40
  article-title: Reducing two-level system dissipations in 3D superconducting niobium resonators by atomic layer deposition and high temperature heat treatment
  publication-title: Appl. Phys. Lett.
  doi: 10.1063/5.0202214
– volume: 30
  start-page: 053003
  year: 2017
  ident: 2024082909431855200_c42
  article-title: 50 years of success for SRF accelerators—A review
  publication-title: Supercond. Sci. Technol.
  doi: 10.1088/1361-6668/aa6376
– start-page: CM-P00047838
  volume-title: Anti-Multipactor tin Coating of RF Power Coupler Components for Tesla at DESY
  year: 2004
  ident: 2024082909431855200_c12
– volume: 2
  start-page: 032030
  year: 2020
  ident: 2024082909431855200_c13
  article-title: Minimum thickness of carbon coating for multipacting suppression
  publication-title: Phys. Rev. Res.
  doi: 10.1103/PhysRevResearch.2.032030
– volume: 214
  start-page: 118
  year: 2018
  ident: 2024082909431855200_c2
  article-title: Past, present and future of active radio frequency experiments in space
  publication-title: Space Sci. Rev.
  doi: 10.1007/s11214-018-0549-7
– volume: 110
  start-page: 111
  year: 2010
  ident: 2024082909431855200_c21
  article-title: Atomic layer deposition: An overview
  publication-title: Chem. Rev.
  doi: 10.1021/cr900056b
SSID ssj0011839
Score 2.4979362
Snippet This study investigates the use of atomic layer deposition (ALD) to mitigate multipacting phenomena inside superconducting radio frequency cavities used in...
SourceID hal
proquest
crossref
scitation
SourceType Open Access Repository
Aggregation Database
Enrichment Source
Index Database
Publisher
SubjectTerms Atomic layer epitaxy
Complex shape objects
Electrical resistivity
Electron emission
Engineering Sciences
Film thickness
Particle accelerators
Physics
Titanium nitride
Title Multipacting mitigation by atomic layer deposition: The case study of titanium nitride
URI http://dx.doi.org/10.1063/5.0221943
https://www.proquest.com/docview/3098361122
https://hal.science/hal-04879943
Volume 136
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwjV1LS8NAEB58IOpBtCrWF4v14CWa3c0mG2_FB0VUFK14C9kXFmwqWgX_vbNNUipY8JqdELIzm_kmM_MNwGGOMbIzzAU2NDqIlHRBKv24l0iHSphcRNr3O9_cxp1udPUsnmegNSWDH_MTcYxuBkNtPgvzDMExmu58--r8_m6cLPBOvqzkoIFMk7QmEJq8-ZfbmX3xRY8TiHIR3U2Z-Z5wLpersFKhQtIu1bgGM7ZowPIEV2ADFka1mvpjHZ5GTbO-uREXSL9XsmQMCqK-CYbQ_Z4mrzkiaWJsXZJ1StAciEaPRUZ8smTgiO8uK3qffYKH-r1n7AZ0Ly8ezzpBNR4h0Dymw0DT0OYxtxGGgDbhnvvNcRNrIVSqpdEyMQiOFNNKSp6r0OVxzl3ktKGJo5zyTZgrBoXdAoJBDbOhSkWiTZQLK5VniWFGp4nVVKgmHNW7l9U75UdYvGajHHbMM5FVG92Eg7HoW0mY8acQqmC87imuO-3rzF_DL0qSosgXbcJuraGsOlgfGQ9TiW9PGWtCa6y16U_a_pfUDiwxBCv-XzGTuzA3fP-0ewg2hmofje385vphvzK6H5FpzuM
linkProvider American Institute of Physics
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwtV1Lb9QwEB71IVQ4ICggFgpYPCQuaWM7ThwkDitKtW23FUgt6i31UwTtZlfdXVB_FP-RcR7LIoHEpdfYymPG9nyTmfkG4LVCH9lb5iMXWxMlWvool6HdS2JiLawSiQn1zien6eA8OboQF2vws6uFwZeY7apyWgfxv6npXivAaISYczH9TTiQ8j2xiwYInfCud_Wxu_6BHtvs_eE-qvcNYwcfzz4MorapQGR4SueRobFTKXcJOk4u44ExzXObGiF0bqQ1MrMIKTQzWkqudOxVqrhPvLE085RTjvddh030_lPcRJv9o_3Pn5ZhiwA3mpwSGsk8yzsqo9WX_cMArn8N6Zcr2HYLDV8Tg18xcwf34G6LT0m_kcd9WHPVNtxZYS3chlt11qiZPYAvdfluKLPEATIuG76OSUX0NUFnflwaMlKI6Yl1XXLYO4ILkxi0naRmtiUTT0KdW1UuxgSPl6vSuodwfiMyfQQb1aRyj4Gge8VcrHORGZso4aQOfDXMmjxzhgrdg7ed9IpOUqGZxqioo-kpL0TRCroHL5dTpw11x18noQqW44Fse9AfFuEanm1ZjlO-0x7sdBoq2i0-K3icS_x6ylgPXi219u8nPfmvWS9ga3B2MiyGh6fHT-E2QwgV_mAzuQMb86uFe4YQaK6ftwuPwOVNr_VfY0cUuQ
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Multipacting+mitigation+by+atomic+layer+deposition%3A+The+case+study+of+titanium+nitride&rft.jtitle=Journal+of+applied+physics&rft.au=Kalboussi%2C+Y&rft.au=Dadouch%2C+Sarah&rft.au=Delatte%2C+B&rft.au=Miserque%2C+F&rft.date=2024-08-28&rft.pub=American+Institute+of+Physics&rft.issn=0021-8979&rft.eissn=1089-7550&rft.volume=136&rft_id=info:doi/10.1063%2F5.0221943&rft.externalDBID=HAS_PDF_LINK&rft.externalDocID=oai_HAL_hal_04879943v1
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0021-8979&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0021-8979&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0021-8979&client=summon