Polarized Raman spectroscopy analysis of SiHX bonds in nanocrystalline silicon thin films - Chaigneau, M.; Johnson, E.V.; Kroely, L.; Roca i Cabarrocas, P.; Ossikovski, R. (Thin solid films, 2013)
Keywords: Applied sciences; Cross-disciplinary physics: materials science; rheology; Deposition; Energy; Exact sciences and technology; Ion and electron beam-assisted deposition; ion plating; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Nanocrystalline silicon; Nanocrystals; Nanoscale materials and structures: fabrication and characterization; Natural energy; Origins; Other topics in nanoscale materials and structures; Photovoltaic conversion; Physics; Physics of gases, plasmas and electric discharges; Physics of plasmas and electric discharges; Plasma applications; Plasma-based ion implantation and deposition; Polarized Raman spectroscopy; Raman scattering; Scattering; Solar cell; Solar cells; Solar cells. Photoelectrochemical cells; Solar energy; Stretching; Thin film; Thin films; Solar cell; Polarized Raman spectroscopy; Nanocrystalline silicon; Thin film; Raman spectra; Infrared spectroscopy; Fourier transform spectroscopy; XRD; Symmetry groups; Nanostructures; Photovoltaic cell; Thin films; Crystallites; Hydrogen bonds; Raman scattering; Chemical bonds; Silicon; Absorption spectra; Stretching; Nanocrystal; Solar cells; Symmetry property; Secondary ion mass spectrometry; Deposition rate; Raman spectroscopy; Interfaces; Vibrational modes; Plasma deposition