APA (7th ed.) Citation

Chaigneau, M., Johnson, E., Kroely, L., Roca i Cabarrocas, P., & Ossikovski, R. (2013). Polarized Raman spectroscopy analysis of SiHX bonds in nanocrystalline silicon thin films. Thin solid films, 537, 145-148. https://doi.org/10.1016/j.tsf.2013.03.021

Chicago Style (17th ed.) Citation

Chaigneau, M., E.V Johnson, L. Kroely, P. Roca i Cabarrocas, and R. Ossikovski. "Polarized Raman Spectroscopy Analysis of SiHX Bonds in Nanocrystalline Silicon Thin Films." Thin Solid Films 537 (2013): 145-148. https://doi.org/10.1016/j.tsf.2013.03.021.

MLA (9th ed.) Citation

Chaigneau, M., et al. "Polarized Raman Spectroscopy Analysis of SiHX Bonds in Nanocrystalline Silicon Thin Films." Thin Solid Films, vol. 537, 2013, pp. 145-148, https://doi.org/10.1016/j.tsf.2013.03.021.