APA (7th ed.) Citation

Fan, S. S., Hsu, C., Tsai, D., Chou, M. C., Jen, C., & Tsou, J. (2022). Key Feature Identification for Monitoring Wafer-to-Wafer Variation in Semiconductor Manufacturing. IEEE transactions on automation science and engineering, 19(3), 1-12. https://doi.org/10.1109/TASE.2022.3141426

Chicago Style (17th ed.) Citation

Fan, Shu-Kai S., Chia-Yu Hsu, Du-Ming Tsai, Mabel C. Chou, Chih-Hung Jen, and Jen-Hsuan Tsou. "Key Feature Identification for Monitoring Wafer-to-Wafer Variation in Semiconductor Manufacturing." IEEE Transactions on Automation Science and Engineering 19, no. 3 (2022): 1-12. https://doi.org/10.1109/TASE.2022.3141426.

MLA (9th ed.) Citation

Fan, Shu-Kai S., et al. "Key Feature Identification for Monitoring Wafer-to-Wafer Variation in Semiconductor Manufacturing." IEEE Transactions on Automation Science and Engineering, vol. 19, no. 3, 2022, pp. 1-12, https://doi.org/10.1109/TASE.2022.3141426.