Detailing Influence of Contact Condition and Island Edge on Dual-Configuration Kelvin Pseudo-MOSFET Method - Mori, Daigo; Nakata, Iori; Matsuda, Masayoshi; Sato, Shingo (IEEE transactions on electron devices, 2021)
Keywords: Carrier mobility; Channel resistance; Chemical treatment; Cleaning; Configurations; Contact pressure; contact resistance; correction factor; Current measurement; Electric contacts; Electric variables; island edge; Kelvin; Kelvin measurement; Metal oxide semiconductors; Metals; MOSFETs; Probes; pseudo-metal-oxide-semiconductor-field-effect-transistor (pseudo-MOSFET); sheet resistance; Silicon; silicon-on-insulator (SOI); Transistors