Electrothermal Simulation of the Hot-Spot and Its Countermeasures in Cellular Bipolar Power Transistors
This paper deals with a theoretical study of the hot-spot onset (HSO) in cellular bipolar power transistors. This well-known phenomenon consists of a current crowding within few cells occurring for high power conditions, which significantly decreases the forward safe operating area (FSOA) of the dev...
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Published in | IEEE transactions on components and packaging technologies Vol. 32; no. 2; pp. 493 - 500 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
New York
IEEE
01.06.2009
The Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
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Abstract | This paper deals with a theoretical study of the hot-spot onset (HSO) in cellular bipolar power transistors. This well-known phenomenon consists of a current crowding within few cells occurring for high power conditions, which significantly decreases the forward safe operating area (FSOA) of the device. The study was performed on a virtual sample by means of a fast, fully analytical electrothermal simulator operating in the steady state regime and under the condition of imposed input base current. The purpose was to study the dependence of the phenomenon on several thermal and geometrical factors and to test suitable counter measures able to impinge this phenomenon at higher biases or to completely eliminate it. The power threshold of HSO and its localization within the silicon die were observed as a function of the electrical bias conditions as for instance the collector voltage, the equivalent thermal resistance of the assembling structure underlying the silicon die, the value of the ballasting resistances purposely added in the emitter metal interconnections, and the thickness of the copper heat spreader placed on the die top just to the aim of making more uniform the temperature of the silicon surface. |
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AbstractList | The power threshold of HSO and its localization within the silicon die were observed as a function of the electrical bias conditions as for instance the collector voltage, the equivalent thermal resistance of the assembling structure underlying the silicon die, the value of the ballasting resistances purposely added in the emitter metal interconnections, and the thickness of the copper heat spreader placed on the die top just to the aim of making more uniform the temperature of the silicon surface. This paper deals with a theoretical study of the hot-spot onset (HSO) in cellular bipolar power transistors. This well-known phenomenon consists of a current crowding within few cells occurring for high power conditions, which significantly decreases the forward safe operating area (FSOA) of the device. The study was performed on a virtual sample by means of a fast, fully analytical electrothermal simulator operating in the steady state regime and under the condition of imposed input base current. The purpose was to study the dependence of the phenomenon on several thermal and geometrical factors and to test suitable counter measures able to impinge this phenomenon at higher biases or to completely eliminate it. The power threshold of HSO and its localization within the silicon die were observed as a function of the electrical bias conditions as for instance the collector voltage, the equivalent thermal resistance of the assembling structure underlying the silicon die, the value of the ballasting resistances purposely added in the emitter metal interconnections, and the thickness of the copper heat spreader placed on the die top just to the aim of making more uniform the temperature of the silicon surface. |
Author | Stefani, F. Bagnoli, P.E. |
Author_xml | – sequence: 1 givenname: P.E. surname: Bagnoli fullname: Bagnoli, P.E. organization: Dept. of Inf. Eng., Univ. of Pisa, Pisa, Italy – sequence: 2 givenname: F. surname: Stefani fullname: Stefani, F. organization: Dept. of Inf. Eng., Univ. of Pisa, Pisa, Italy |
BookMark | eNp9kU1LxDAQhoMouH78Ab0ED3rq2ny0SY5a1BUEBddzyHYn2qWbrEmK-O9NXfHgwcvMMDzvfPAeoF3nHSB0QsopIaW6nDdXT_MpLUs5BkIU20ETUlWiUErQ3bGmpGCMkX10EOMqM1xyNUGvNz20Kfj0BmFtevzcrYfepM477C3OXTzzqXje-ISNW-L7FHHjB5cyDSYOASLuHG6g77Ms4Otu48f85D8g4HkwLnYx-RCP0J41fYTjn3yIXm5v5s2seHi8u2-uHoqWVSIVjBhDVV21UAtmF7wlQrZiaa0FSelSqBKokJW0hltbEcvlopZQM7owQAwIdogutnM3wb8PEJNed7HN5xkHfohaiqrknHKWyfN_SVYzzhRXGTz7A678EFz-QudLeJm30wzRLdQGH2MAqzehW5vwqUmpR4v0t0V6tEj_WJRFp1tRBwC_Al7XsqKKfQERHo_0 |
CODEN | ITCPFB |
CitedBy_id | crossref_primary_10_1109_ACCESS_2021_3093098 crossref_primary_10_1103_PhysRevB_86_165317 |
Cites_doi | 10.1016/S0026-2692(96)00030-4 10.1109/T-ED.1976.18495 10.1109/4.711343 10.1016/j.mejo.2006.10.001 10.1109/16.69894 10.1109/16.481724 10.1109/ISPSD.1999.764106 10.1109/ESSDERC.2002.194989 10.1109/THETA.2007.363413 |
ContentType | Journal Article |
Copyright | Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2009 |
Copyright_xml | – notice: Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2009 |
DBID | 97E RIA RIE AAYXX CITATION 7SP 8FD F28 FR3 L7M |
DOI | 10.1109/TCAPT.2008.2001193 |
DatabaseName | IEEE All-Society Periodicals Package (ASPP) 2005-present IEEE All-Society Periodicals Package (ASPP) 1998-Present IEEE Electronic Library Online CrossRef Electronics & Communications Abstracts Technology Research Database ANTE: Abstracts in New Technology & Engineering Engineering Research Database Advanced Technologies Database with Aerospace |
DatabaseTitle | CrossRef Engineering Research Database Technology Research Database Advanced Technologies Database with Aerospace ANTE: Abstracts in New Technology & Engineering Electronics & Communications Abstracts |
DatabaseTitleList | Engineering Research Database Engineering Research Database |
Database_xml | – sequence: 1 dbid: RIE name: IEEE Electronic Library Online url: https://proxy.k.utb.cz/login?url=https://ieeexplore.ieee.org/ sourceTypes: Publisher |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Engineering |
EISSN | 1557-9972 |
EndPage | 500 |
ExternalDocumentID | 2301344171 10_1109_TCAPT_2008_2001193 4668529 |
Genre | orig-research |
GroupedDBID | -~X 0R~ 29I 4.4 5GY 5VS 6IK 85S 97E AAJGR AASAJ ABQJQ ABVLG ACGFO ACIWK AETIX AI. AIBXA ALLEH ALMA_UNASSIGNED_HOLDINGS BEFXN BFFAM BGNUA BKEBE BPEOZ CS3 DU5 EBS EJD HZ~ H~9 IFIPE IFJZH IPLJI JAVBF LAI M43 O9- OCL RIA RIE RIG RNS VH1 VJK XFK AAYXX CITATION 7SP 8FD F28 FR3 L7M |
ID | FETCH-LOGICAL-c357t-31aa2965ce673fb4c178c7dfffe822d790e27858fa4ff51f48b68e632bae1ae73 |
IEDL.DBID | RIE |
ISSN | 1521-3331 |
IngestDate | Sat Aug 17 03:39:25 EDT 2024 Fri Aug 16 04:10:28 EDT 2024 Thu Oct 10 18:38:39 EDT 2024 Fri Aug 23 02:47:13 EDT 2024 Wed Jun 26 19:27:00 EDT 2024 |
IsPeerReviewed | true |
IsScholarly | true |
Issue | 2 |
Language | English |
LinkModel | DirectLink |
MergedId | FETCHMERGED-LOGICAL-c357t-31aa2965ce673fb4c178c7dfffe822d790e27858fa4ff51f48b68e632bae1ae73 |
Notes | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
PQID | 858406322 |
PQPubID | 23500 |
PageCount | 8 |
ParticipantIDs | crossref_primary_10_1109_TCAPT_2008_2001193 proquest_miscellaneous_36343949 ieee_primary_4668529 proquest_journals_858406322 proquest_miscellaneous_875044243 |
PublicationCentury | 2000 |
PublicationDate | 2009-06-01 |
PublicationDateYYYYMMDD | 2009-06-01 |
PublicationDate_xml | – month: 06 year: 2009 text: 2009-06-01 day: 01 |
PublicationDecade | 2000 |
PublicationPlace | New York |
PublicationPlace_xml | – name: New York |
PublicationTitle | IEEE transactions on components and packaging technologies |
PublicationTitleAbbrev | TCAPT |
PublicationYear | 2009 |
Publisher | IEEE The Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher_xml | – name: IEEE – name: The Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
References | ref13 ref12 ref10 bagnoli (ref5) 2002 ref1 bagnoli (ref4) 2001 montesi (ref7) 2004 ref8 ref9 ref3 ref6 hower (ref2) 1976 stenzel (ref11) 1998 |
References_xml | – year: 2001 ident: ref4 article-title: electro-thermal simulation of hot-spot phenomena in cellular bipolar power transistors: the influence of package thermal resistance publication-title: Proc IPACK'01 contributor: fullname: bagnoli – ident: ref1 doi: 10.1016/S0026-2692(96)00030-4 – ident: ref6 doi: 10.1109/T-ED.1976.18495 – ident: ref12 doi: 10.1109/4.711343 – ident: ref9 doi: 10.1016/j.mejo.2006.10.001 – ident: ref10 doi: 10.1109/16.69894 – ident: ref13 doi: 10.1109/16.481724 – ident: ref3 doi: 10.1109/ISPSD.1999.764106 – start-page: 53 year: 1998 ident: ref11 article-title: simulation of influence of heat removal on power gains of heterojunction bipolar transistors publication-title: Proc Workshop on Compound Semicondoctor Devices and Integrated Circuits contributor: fullname: stenzel – start-page: 234 year: 1976 ident: ref2 article-title: stable hot-spots and second breakdown in power transistors publication-title: Proc IEEE PESC 76 Conf contributor: fullname: hower – start-page: 547 year: 2002 ident: ref5 article-title: study of hot spot phenomena in power transistors by analytical electro-thermal simulation publication-title: Proc 32nd Eur Solid-State Device Res Conf doi: 10.1109/ESSDERC.2002.194989 contributor: fullname: bagnoli – ident: ref8 doi: 10.1109/THETA.2007.363413 – year: 2004 ident: ref7 article-title: steady-state thermal mapping of electronic devices with multi-layer stack mountings by analytical relationships publication-title: Proc ITSS II ASME-ZSIS Conf contributor: fullname: montesi |
SSID | ssj0014849 |
Score | 1.7661756 |
Snippet | This paper deals with a theoretical study of the hot-spot onset (HSO) in cellular bipolar power transistors. This well-known phenomenon consists of a current... The power threshold of HSO and its localization within the silicon die were observed as a function of the electrical bias conditions as for instance the... |
SourceID | proquest crossref ieee |
SourceType | Aggregation Database Publisher |
StartPage | 493 |
SubjectTerms | Analytical models Assembling Ballasting resistors Cellular copper heat spreader Devices Electric power generation Electrothermal effects electrothermal modeling hot spot Performance analysis power bipolar transistors Power transistors Proximity effect Silicon Simulation Steady-state Surface resistance Thermal factors Thermal resistance |
Title | Electrothermal Simulation of the Hot-Spot and Its Countermeasures in Cellular Bipolar Power Transistors |
URI | https://ieeexplore.ieee.org/document/4668529 https://www.proquest.com/docview/858406322 https://search.proquest.com/docview/36343949 https://search.proquest.com/docview/875044243 |
Volume | 32 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwjV1LT9wwEB4BJ3roA6i6pQ8femuzbGLHjyNdgbaVQEgsErfIdsbVqpCsmuyFX48f2RUFKvUWJbZieex5zzcAX4QyudN5mVmJNGNoA-Qt8zbPRHl7yxlqdah3Pjvnsyv287q83oJvm1oYRIzJZzgOjzGWX7d2FVxlR4xzWRZqG7aFUqlWaxMxYDKqukEcZZTSfF0gM1FH8-nxxTylTRYR44z-JYRiV5UnrDjKl9NXcLZeWUor-T1e9WZs7x6BNv7v0l_Dy0HRJMfpZLyBLWz24MUD-MF9-HWSeuAEHfDWj71c3A7NvEjriH9LZm2fXS7bnuimJj_6joQS9sDMk2exI4uGTPHmJuSyku-LZbCTyUVovEaiEIwYJN0BXJ2ezKezbGi8kFlait7zZa0LxUuLXFBnmM2FtKJ2zqHXJ2qhJlgIWUqnmXNl7pg0XCKnhdGYaxT0Lew0bYPvgNS1MoW0JTovB7mXjHntLTR_cpgoeG3yEXxdU6JaJnyNKtolE1VFuqU-mQPdRrAftnYzctjVERyuiVcNV7Cr_Pq8suL51Qg-b776uxMCIrrBdtVVlNNQGOznk3-MkAH9nhWMvn_-z4ewm8JLwS3zAXb6Pyv86LWU3nyKx_MeUxzmLQ |
link.rule.ids | 315,783,787,799,27936,27937,55086 |
linkProvider | IEEE |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwjV1LT9wwEB5Remh7oA9adaEtPvRGs2xix3aOsAItlEVILBK3yHbGaFVIVk320l-PH9kVLa3UW5Q4iuVxZr7xzHwD8FUUOrUqzRMjkSYMjae8Zc7nGRXO37KaGuXrnacXfHLNzm7ymw34tq6FQcSQfIZDfxli-VVjlv6o7IBxLvOseAbPHa6WPFZrrWMGTAaw6w1SQilNVyUyo-JgNj68nMXEySywnNHfzFDoq_JEGQcLc_Iapqu5xcSSH8Nlp4fm1x-0jf87-Tew1UNNchj3xlvYwPodvHpEQLgNt8exC45Hgfdu7NX8vm_nRRpL3F0yabrkatF0RNUVOe1a4ovYvTqPZ4stmddkjHd3PpuVHM0X3lMml771GglmMLCQtO_h-uR4Np4kfeuFxNBcdE4zK5UVPDfIBbWamVRIIyprLTpEUYlihJmQubSKWZunlknNJXKaaYWpQkE_wGbd1PgRSFUVOpMmR-ssIXe2Ma2cj-b2DhMZr3Q6gP2VJMpFZNgog2cyKsogt9gps5fbALb90q5H9qs6gN2V8Mr-J2xLNz8HV5zGGsDe-qn7e3xIRNXYLNuScupLg9375B8jpOe_ZxmjO3__8h68mMym5-X56cX3XXgZg03-kOYTbHY_l_jZYZZOfwlb9QF9nOl4 |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Electrothermal+Simulation+of+the+Hot-Spot+and+Its+Countermeasures+in+Cellular+Bipolar+Power+Transistors&rft.jtitle=IEEE+transactions+on+components+and+packaging+technologies&rft.au=Bagnoli%2C+P+E&rft.au=Stefani%2C+F&rft.date=2009-06-01&rft.issn=1521-3331&rft.volume=32&rft.issue=2&rft_id=info:doi/10.1109%2FTCAPT.2008.2001193&rft.externalDBID=NO_FULL_TEXT |
thumbnail_l | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=1521-3331&client=summon |
thumbnail_m | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=1521-3331&client=summon |
thumbnail_s | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=1521-3331&client=summon |