Electrothermal Simulation of the Hot-Spot and Its Countermeasures in Cellular Bipolar Power Transistors

This paper deals with a theoretical study of the hot-spot onset (HSO) in cellular bipolar power transistors. This well-known phenomenon consists of a current crowding within few cells occurring for high power conditions, which significantly decreases the forward safe operating area (FSOA) of the dev...

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Published inIEEE transactions on components and packaging technologies Vol. 32; no. 2; pp. 493 - 500
Main Authors Bagnoli, P.E., Stefani, F.
Format Journal Article
LanguageEnglish
Published New York IEEE 01.06.2009
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
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Abstract This paper deals with a theoretical study of the hot-spot onset (HSO) in cellular bipolar power transistors. This well-known phenomenon consists of a current crowding within few cells occurring for high power conditions, which significantly decreases the forward safe operating area (FSOA) of the device. The study was performed on a virtual sample by means of a fast, fully analytical electrothermal simulator operating in the steady state regime and under the condition of imposed input base current. The purpose was to study the dependence of the phenomenon on several thermal and geometrical factors and to test suitable counter measures able to impinge this phenomenon at higher biases or to completely eliminate it. The power threshold of HSO and its localization within the silicon die were observed as a function of the electrical bias conditions as for instance the collector voltage, the equivalent thermal resistance of the assembling structure underlying the silicon die, the value of the ballasting resistances purposely added in the emitter metal interconnections, and the thickness of the copper heat spreader placed on the die top just to the aim of making more uniform the temperature of the silicon surface.
AbstractList The power threshold of HSO and its localization within the silicon die were observed as a function of the electrical bias conditions as for instance the collector voltage, the equivalent thermal resistance of the assembling structure underlying the silicon die, the value of the ballasting resistances purposely added in the emitter metal interconnections, and the thickness of the copper heat spreader placed on the die top just to the aim of making more uniform the temperature of the silicon surface.
This paper deals with a theoretical study of the hot-spot onset (HSO) in cellular bipolar power transistors. This well-known phenomenon consists of a current crowding within few cells occurring for high power conditions, which significantly decreases the forward safe operating area (FSOA) of the device. The study was performed on a virtual sample by means of a fast, fully analytical electrothermal simulator operating in the steady state regime and under the condition of imposed input base current. The purpose was to study the dependence of the phenomenon on several thermal and geometrical factors and to test suitable counter measures able to impinge this phenomenon at higher biases or to completely eliminate it. The power threshold of HSO and its localization within the silicon die were observed as a function of the electrical bias conditions as for instance the collector voltage, the equivalent thermal resistance of the assembling structure underlying the silicon die, the value of the ballasting resistances purposely added in the emitter metal interconnections, and the thickness of the copper heat spreader placed on the die top just to the aim of making more uniform the temperature of the silicon surface.
Author Stefani, F.
Bagnoli, P.E.
Author_xml – sequence: 1
  givenname: P.E.
  surname: Bagnoli
  fullname: Bagnoli, P.E.
  organization: Dept. of Inf. Eng., Univ. of Pisa, Pisa, Italy
– sequence: 2
  givenname: F.
  surname: Stefani
  fullname: Stefani, F.
  organization: Dept. of Inf. Eng., Univ. of Pisa, Pisa, Italy
BookMark eNp9kU1LxDAQhoMouH78Ab0ED3rq2ny0SY5a1BUEBddzyHYn2qWbrEmK-O9NXfHgwcvMMDzvfPAeoF3nHSB0QsopIaW6nDdXT_MpLUs5BkIU20ETUlWiUErQ3bGmpGCMkX10EOMqM1xyNUGvNz20Kfj0BmFtevzcrYfepM477C3OXTzzqXje-ISNW-L7FHHjB5cyDSYOASLuHG6g77Ms4Otu48f85D8g4HkwLnYx-RCP0J41fYTjn3yIXm5v5s2seHi8u2-uHoqWVSIVjBhDVV21UAtmF7wlQrZiaa0FSelSqBKokJW0hltbEcvlopZQM7owQAwIdogutnM3wb8PEJNed7HN5xkHfohaiqrknHKWyfN_SVYzzhRXGTz7A678EFz-QudLeJm30wzRLdQGH2MAqzehW5vwqUmpR4v0t0V6tEj_WJRFp1tRBwC_Al7XsqKKfQERHo_0
CODEN ITCPFB
CitedBy_id crossref_primary_10_1109_ACCESS_2021_3093098
crossref_primary_10_1103_PhysRevB_86_165317
Cites_doi 10.1016/S0026-2692(96)00030-4
10.1109/T-ED.1976.18495
10.1109/4.711343
10.1016/j.mejo.2006.10.001
10.1109/16.69894
10.1109/16.481724
10.1109/ISPSD.1999.764106
10.1109/ESSDERC.2002.194989
10.1109/THETA.2007.363413
ContentType Journal Article
Copyright Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2009
Copyright_xml – notice: Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2009
DBID 97E
RIA
RIE
AAYXX
CITATION
7SP
8FD
F28
FR3
L7M
DOI 10.1109/TCAPT.2008.2001193
DatabaseName IEEE All-Society Periodicals Package (ASPP) 2005-present
IEEE All-Society Periodicals Package (ASPP) 1998-Present
IEEE Electronic Library Online
CrossRef
Electronics & Communications Abstracts
Technology Research Database
ANTE: Abstracts in New Technology & Engineering
Engineering Research Database
Advanced Technologies Database with Aerospace
DatabaseTitle CrossRef
Engineering Research Database
Technology Research Database
Advanced Technologies Database with Aerospace
ANTE: Abstracts in New Technology & Engineering
Electronics & Communications Abstracts
DatabaseTitleList

Engineering Research Database
Engineering Research Database
Database_xml – sequence: 1
  dbid: RIE
  name: IEEE Electronic Library Online
  url: https://proxy.k.utb.cz/login?url=https://ieeexplore.ieee.org/
  sourceTypes: Publisher
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
EISSN 1557-9972
EndPage 500
ExternalDocumentID 2301344171
10_1109_TCAPT_2008_2001193
4668529
Genre orig-research
GroupedDBID -~X
0R~
29I
4.4
5GY
5VS
6IK
85S
97E
AAJGR
AASAJ
ABQJQ
ABVLG
ACGFO
ACIWK
AETIX
AI.
AIBXA
ALLEH
ALMA_UNASSIGNED_HOLDINGS
BEFXN
BFFAM
BGNUA
BKEBE
BPEOZ
CS3
DU5
EBS
EJD
HZ~
H~9
IFIPE
IFJZH
IPLJI
JAVBF
LAI
M43
O9-
OCL
RIA
RIE
RIG
RNS
VH1
VJK
XFK
AAYXX
CITATION
7SP
8FD
F28
FR3
L7M
ID FETCH-LOGICAL-c357t-31aa2965ce673fb4c178c7dfffe822d790e27858fa4ff51f48b68e632bae1ae73
IEDL.DBID RIE
ISSN 1521-3331
IngestDate Sat Aug 17 03:39:25 EDT 2024
Fri Aug 16 04:10:28 EDT 2024
Thu Oct 10 18:38:39 EDT 2024
Fri Aug 23 02:47:13 EDT 2024
Wed Jun 26 19:27:00 EDT 2024
IsPeerReviewed true
IsScholarly true
Issue 2
Language English
LinkModel DirectLink
MergedId FETCHMERGED-LOGICAL-c357t-31aa2965ce673fb4c178c7dfffe822d790e27858fa4ff51f48b68e632bae1ae73
Notes ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
PQID 858406322
PQPubID 23500
PageCount 8
ParticipantIDs crossref_primary_10_1109_TCAPT_2008_2001193
proquest_miscellaneous_36343949
ieee_primary_4668529
proquest_journals_858406322
proquest_miscellaneous_875044243
PublicationCentury 2000
PublicationDate 2009-06-01
PublicationDateYYYYMMDD 2009-06-01
PublicationDate_xml – month: 06
  year: 2009
  text: 2009-06-01
  day: 01
PublicationDecade 2000
PublicationPlace New York
PublicationPlace_xml – name: New York
PublicationTitle IEEE transactions on components and packaging technologies
PublicationTitleAbbrev TCAPT
PublicationYear 2009
Publisher IEEE
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher_xml – name: IEEE
– name: The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
References ref13
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– ident: ref12
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– ident: ref9
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– ident: ref10
  doi: 10.1109/16.69894
– ident: ref13
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SSID ssj0014849
Score 1.7661756
Snippet This paper deals with a theoretical study of the hot-spot onset (HSO) in cellular bipolar power transistors. This well-known phenomenon consists of a current...
The power threshold of HSO and its localization within the silicon die were observed as a function of the electrical bias conditions as for instance the...
SourceID proquest
crossref
ieee
SourceType Aggregation Database
Publisher
StartPage 493
SubjectTerms Analytical models
Assembling
Ballasting resistors
Cellular
copper heat spreader
Devices
Electric power generation
Electrothermal effects
electrothermal modeling
hot spot
Performance analysis
power bipolar transistors
Power transistors
Proximity effect
Silicon
Simulation
Steady-state
Surface resistance
Thermal factors
Thermal resistance
Title Electrothermal Simulation of the Hot-Spot and Its Countermeasures in Cellular Bipolar Power Transistors
URI https://ieeexplore.ieee.org/document/4668529
https://www.proquest.com/docview/858406322
https://search.proquest.com/docview/36343949
https://search.proquest.com/docview/875044243
Volume 32
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwjV1LT9wwEB4BJ3roA6i6pQ8femuzbGLHjyNdgbaVQEgsErfIdsbVqpCsmuyFX48f2RUFKvUWJbZieex5zzcAX4QyudN5mVmJNGNoA-Qt8zbPRHl7yxlqdah3Pjvnsyv287q83oJvm1oYRIzJZzgOjzGWX7d2FVxlR4xzWRZqG7aFUqlWaxMxYDKqukEcZZTSfF0gM1FH8-nxxTylTRYR44z-JYRiV5UnrDjKl9NXcLZeWUor-T1e9WZs7x6BNv7v0l_Dy0HRJMfpZLyBLWz24MUD-MF9-HWSeuAEHfDWj71c3A7NvEjriH9LZm2fXS7bnuimJj_6joQS9sDMk2exI4uGTPHmJuSyku-LZbCTyUVovEaiEIwYJN0BXJ2ezKezbGi8kFlait7zZa0LxUuLXFBnmM2FtKJ2zqHXJ2qhJlgIWUqnmXNl7pg0XCKnhdGYaxT0Lew0bYPvgNS1MoW0JTovB7mXjHntLTR_cpgoeG3yEXxdU6JaJnyNKtolE1VFuqU-mQPdRrAftnYzctjVERyuiVcNV7Cr_Pq8suL51Qg-b776uxMCIrrBdtVVlNNQGOznk3-MkAH9nhWMvn_-z4ewm8JLwS3zAXb6Pyv86LWU3nyKx_MeUxzmLQ
link.rule.ids 315,783,787,799,27936,27937,55086
linkProvider IEEE
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwjV1LT9wwEB5Remh7oA9adaEtPvRGs2xix3aOsAItlEVILBK3yHbGaFVIVk320l-PH9kVLa3UW5Q4iuVxZr7xzHwD8FUUOrUqzRMjkSYMjae8Zc7nGRXO37KaGuXrnacXfHLNzm7ymw34tq6FQcSQfIZDfxli-VVjlv6o7IBxLvOseAbPHa6WPFZrrWMGTAaw6w1SQilNVyUyo-JgNj68nMXEySywnNHfzFDoq_JEGQcLc_Iapqu5xcSSH8Nlp4fm1x-0jf87-Tew1UNNchj3xlvYwPodvHpEQLgNt8exC45Hgfdu7NX8vm_nRRpL3F0yabrkatF0RNUVOe1a4ovYvTqPZ4stmddkjHd3PpuVHM0X3lMml771GglmMLCQtO_h-uR4Np4kfeuFxNBcdE4zK5UVPDfIBbWamVRIIyprLTpEUYlihJmQubSKWZunlknNJXKaaYWpQkE_wGbd1PgRSFUVOpMmR-ssIXe2Ma2cj-b2DhMZr3Q6gP2VJMpFZNgog2cyKsogt9gps5fbALb90q5H9qs6gN2V8Mr-J2xLNz8HV5zGGsDe-qn7e3xIRNXYLNuScupLg9375B8jpOe_ZxmjO3__8h68mMym5-X56cX3XXgZg03-kOYTbHY_l_jZYZZOfwlb9QF9nOl4
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Electrothermal+Simulation+of+the+Hot-Spot+and+Its+Countermeasures+in+Cellular+Bipolar+Power+Transistors&rft.jtitle=IEEE+transactions+on+components+and+packaging+technologies&rft.au=Bagnoli%2C+P+E&rft.au=Stefani%2C+F&rft.date=2009-06-01&rft.issn=1521-3331&rft.volume=32&rft.issue=2&rft_id=info:doi/10.1109%2FTCAPT.2008.2001193&rft.externalDBID=NO_FULL_TEXT
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=1521-3331&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=1521-3331&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=1521-3331&client=summon