Thickness and tensile stress determination of black silicon layers by spectral reflectance and Raman scattering - Králik, Martin; Jurečka, Stanislav; Pinčík, Emil (Journal of Electrical Engineering, 2019)
Keywords: anodic etching; Axial stress; black silicon; Crystal lattices; Effective medium theory; electrochemical etching; Etching; Hydrofluoric acid; Mathematical models; Optical properties; Parameters; porous silicon; Raman scattering; Raman spectra; Reflectance; SCOUT; Silicon substrates; Spectral reflectance; Spectrometers; Tensile stress; Thickness