APA (7th ed.) Citation

Králik, M., Jurečka, S., & Pinčík, E. (2019). Thickness and tensile stress determination of black silicon layers by spectral reflectance and Raman scattering. Journal of Electrical Engineering, 70(7), 51-57. https://doi.org/10.2478/jee-2019-0041

Chicago Style (17th ed.) Citation

Králik, Martin, Stanislav Jurečka, and Emil Pinčík. "Thickness and Tensile Stress Determination of Black Silicon Layers by Spectral Reflectance and Raman Scattering." Journal of Electrical Engineering 70, no. 7 (2019): 51-57. https://doi.org/10.2478/jee-2019-0041.

MLA (9th ed.) Citation

Králik, Martin, et al. "Thickness and Tensile Stress Determination of Black Silicon Layers by Spectral Reflectance and Raman Scattering." Journal of Electrical Engineering, vol. 70, no. 7, 2019, pp. 51-57, https://doi.org/10.2478/jee-2019-0041.