APA (7th ed.) Citation

Lablali, M., Mes-adi, H., Eddiai, A., & Mazroui, M. (2023). Effect of stepped Si (001) substrate on Cu thin film growth. Surface topography metrology and properties, 11(3), 35020-35031. https://doi.org/10.1088/2051-672X/acfb9b

Chicago Style (17th ed.) Citation

Lablali, M., H. Mes-adi, A. Eddiai, and M. Mazroui. "Effect of Stepped Si (001) Substrate on Cu Thin Film Growth." Surface Topography Metrology and Properties 11, no. 3 (2023): 35020-35031. https://doi.org/10.1088/2051-672X/acfb9b.

MLA (9th ed.) Citation

Lablali, M., et al. "Effect of Stepped Si (001) Substrate on Cu Thin Film Growth." Surface Topography Metrology and Properties, vol. 11, no. 3, 2023, pp. 35020-35031, https://doi.org/10.1088/2051-672X/acfb9b.